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Ceramic powder synthesis and processing are two of the most important technologies in chemical engineering and the ceramics-related area of materials science. This book covers both the processing and the synthesis ofceramic powders in great depth and is indeed the only up-to-date, comprehensive source on the subject available.The application of modern scientific and engineering methods to the field of ceramic powder synthesis has resulted in much greater control of properties. Fundamentals of Ceramic Powder Processing and Synthesis presents examples of these modern methods as they apply to ceramic powders. The book is organized to describe the natural and synthetic raw materials that comprise contemporary ceramics. It covers the three reactant processes used in synthetic ceramic powder synthesis: solid, liquid, andgas.Ceramic powder processing, as a field of materials processing, is undergoing rapid expansion. The present volume is intended as a complete and useful source on this subject of great current interest. It provides comprehensive coverage from a strong chemistry and chemical engineering perspective and is especially applicable to materials scientists, chemical engineers, and applied chemists.Key Features* The most complete and updated reference source on the subject* Comprehensive coverage from a stron chemical engineering and chemistry perspective* Emphasis on both natural and synthetic raw materials in ceramic powder synthesis* Information on reaction kinetics* Superior, more comprehensive coverage than that in existing texts* Sample problems and exercises* Problems at the end of each chapter which supplement the material
Epitaxial Silicon Technology is a single-volume, in-depth review of all the silicon epitaxial growth techniques. This technology is being extended to the growth of epitaxial layers on insulating substrates by means of a variety of lateral seeding approaches. This book is divided into five chapters, and the opening chapter describes the growth of silicon layers by vapor-phase epitaxy, considering both atmospheric and low-pressure growth. The second chapter discusses molecular-beam epitaxial growth of silicon, providing a unique ability to grow very thin layers with precisely controlled doping characteristics. The third chapter introduces the silicon liquid-phase epitaxy, in which the growth of silicon layers arose from a need to decrease the growth temperature and to suppress autodoping. The fourth chapter addresses the growth of silicon on sapphire for improving the radiation hardness of CMOS integrated circuits. The fifth chapter deals with the advances in the application of silicon epitaxial growth. This chapter also discusses the formation of epitaxial layers of silicon on insulators, such as silicon dioxide, which do not provide a natural single crystal surface for growth. Each chapter begins with a discussion on the fundamental transport mechanisms and the kinetics governing the growth rate, followed by a description of the electrical properties that can be achieved in the layers and the restrictions imposed by the growth technique upon the control over its electrical characteristics. Each chapter concludes with a discussion on the applications of the particular growth technique. This reference material will be useful for process technologists and engineers who may need to apply epitaxial growth for device fabrication.
Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemical
A one-stop desk reference, for engineers involved in the use of engineered materials across engineering and electronics, this book will not gather dust on the shelf. It brings together the essential professional reference content from leading international contributors in the field. Material ranges from basic to advanced topics, including materials and process selection and explanations of properties of metals, ceramics, plastics and composites. - A hard-working desk reference, providing all the essential material needed by engineers on a day-to-day basis - Fundamentals, key techniques, engineering best practice and rules-of-thumb together in one quick-reference sourcebook - Definitive content by the leading authors in the field, including Michael Ashby, Robert Messler, Rajiv Asthana and R.J. Crawford