Download Free Structure And Properties Of Multilayered Thin Films Volume 382 Book in PDF and EPUB Free Download. You can read online Structure And Properties Of Multilayered Thin Films Volume 382 and write the review.

Layered thin film structures often have unusual properties which make them appealing in a wide range of applications. Fabrication of submicron and nanometer multilayers can produce metastable phases that many not be predicted from the bulk equilibrium phase diagrams. Understanding the growth, structure, stability and properties of multilayers, and controlling their microstructure through processing, are important in many applications. This book focuses on the relationship of structure and processing to the properties that are relevant to all researchers in the field of multilayers. Topics include: phase transformation and reaction kinetics; processing and growth; structural characterization; magnetic, electronic and optical properties; mechanical properties; X-ray optics; thin-film interfaces.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
"Surface Characterization" provides an authoritative guide to the wide range of powerful techniques that are used to characterize the surfaces of materials. Practical in approach, it not only describes the major analytical techniques but emphasizes how they can be used to solve a multitude of chemical and physical problems. A special feature of the book is that the various techniques are grouped according to the material property under investigation. These parts are preceded by an overview comparing the capabilities of the characterization methods available. Extensive data tables allow the reader to assess rapidly the strengths as well as the pitfalls inherent in each method. Chapters on chemical composition, optical and crystallographic properties, microtopography, surface processes, tribological, electrical and magnetic properties of surface films are featured. In addition, chapters specializing on applications within the life sciences on the microscopic scale and chemometrics are included. "Surface Characterization" is addressed to both academic and industrial audiences. Scientists and engineers working on the production and development of new materials will find it an invaluable reference source. Physicist, chemists, chemical engineers, material scientists and engineers from every area of materials research will benefit from the wealth of practical advice the book provides.
Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.
An interdisciplinary discussion of key materials issues and controversies in strained layer epitaxy is presented in this new volume from MRS. Research involving GeSi alloys and Si:C alloys are well represented. In the case of GeSi alloys, utilizing both strained and relaxed structures appears to be a strong component of the current research. Applications, devices and synthesis of improved relaxed and strained materials are featured. Special efforts to integrate the III-V and IV communities were also made during this symposium, and those efforts are reflected in the proceedings volume as well. Results on compositional graded layers in both the GeSi and III-V materials systems are presented. Topics include: general issues; ordering/low dimensional structures; characterization; device applications; growth of Si-based materials; and growth of compound semiconductors.
While the effects of spontaneous ordering or composition modulation on the properties of semiconductors and optoelectronic devices have been studied with great interest over the past several years, an understanding of the physics and chemistry of these two related phenomena is still in its infancy. This book brings together researchers from around the world to address issues concerning the physics, chemistry and growth parameters for spontaneous ordering and composition modulation. Developments in the use of artificial patterning to obtain new structured materials on a microscopic scale are featured. Advances in characterization techniques are also presented. Topics include: spontaneous ordering; self-assembled structures and quantum dots; self-organized epitaxial structures; composition modulation studies and optoelectronic materials.
A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
This second, comprehensive edition of the pioneering book in this fi eld has been completely revised and extended, now stretching to two volumes. The result is a comprehensive summary of layer-by-layer assembled, truly hybrid nanomaterials and thin fi lms, covering organic, inorganic, colloidal, macromolecular, and biological components, as well as the assembly of nanoscale fi lms derived from them on surfaces. These two volumes are essential for anyone working in the field, as well as scientists and researchers active in materials development, who needs the key knowledge provided herein for linking the field of molecular self-assembly with the bio- and materials sciences.