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For more than 400 years, optical glass has provided mankind with a window into both the hidden microcosm and vast outer cosmos of the known universe, transforming philosophy, science, and engineering through its visage and, thus, shaping modern civilization. Its high transmittance, homogeneity, and precisely defined light refraction properties are the preconditions for highly resolved true-color imaging, making it an intrinsic component of technology in general. From consumer products, such as cameras and binoculars, to microscopes and telescopes-the most essential tools of research in many fields-the role of optical glass is integral to the very foundations of modern science and industry.
This engineering tool provides over 200 time and cost saving rules of thumb--short cuts, tricks, and methods that optical communications veterans have developed through long years of trial and error. * DWDM (Dense Wavelength Division Multiplexing) and SONET (Synchronous Optical NETwork) rules * Information Transmission, fiber optics, and systems rules
Polarized Light and Optical Systems presents polarization optics for undergraduate and graduate students in a way which makes classroom teaching relevant to current issues in optical engineering. This curriculum has been developed and refined for a decade and a half at the University of Arizona’s College of Optical Sciences. Polarized Light and Optical Systems provides a reference for the optical engineer and optical designer in issues related to building polarimeters, designing displays, and polarization critical optical systems. The central theme of Polarized Light and Optical Systems is a unifying treatment of polarization elements as optical elements and optical elements as polarization elements. Key Features Comprehensive presentation of Jones calculus and Mueller calculus with tables and derivations of the Jones and Mueller matrices for polarization elements and polarization effects Classroom-appropriate presentations of polarization of birefringent materials, thin films, stress birefringence, crystal polarizers, liquid crystals, and gratings Discussion of the many forms of polarimeters, their trade-offs, data reduction methods, and polarization artifacts Exposition of the polarization ray tracing calculus to integrate polarization with ray tracing Explanation of the sources of polarization aberrations in optical systems and the functional forms of these polarization aberrations Problem sets to build students’ problem-solving capabilities.
This tutorial presents optomechanical modeling techniques to effectively design and analyze high-performance optical systems. It discusses thermal and structural modeling methods that use finite-element analysis to predict the integrity and performance of optical elements and optical support structures. Includes accompanying CD-ROM with examples.
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature. The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?
What is light? Where are optics and photonics present in our lives and in nature? What lies behind different optical phenomena? What is an optical instrument? How does the eye resemble an optical instrument? How can we explain human vision? This book, written by a group of young scientists, answers these questions and many more.
"Today's SWIR, MWIR, LWIR and multispectral technologies cover a wide range of commercial and military applications and continue to rapidly expand in almost every aspect of our lives. This Field Guide focuses on the most common infrared crystals and glasses used in these systems, from their manufacturing methods through modern optical fabrication technologies to the end-use applications. Detailed optical, crystallographic, mechanical, chemical, and thermal properties of the most popular infrared materials are reviewed in detail along with process flows and relative comparisons. The Field Guide to Infrared Optical Materials provides a concise and convenient resource for those interested in the materials used in infrared optical systems"--