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Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial pistoncylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded.Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial pistoncylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.
This volume will contain about 40 invited papers and over 200 contributed papers covering all aspects of high-pressure research in physics, chemistry, materials science and biology. It will serve as an exhaustive review of recent achievements in these areas and of the topics of major interest. The list of subjects include: 1) Electronic, optical, and transport properties of solids; 2) Phase transitions, structural properties, and lattice dynamics; 3) Crystal growth and material synthesis; 4) Organic synthesis and biological applications; 5) Geophysical sciences; 6) Instrumentation and metrology; 7) Superhard materials; 8) Ceramics and sintering; 9) Food processing; 10) Plasticity and hydroextrusion.Contributors include: N W Ashcroft (USA), V Blank (Russia), E M Cambell (USA), H G Drickamer (USA), W B Holzapfel (Germany), J Karpinski (Switzerland), H K Mao (USA), W J Nellis (USA), W Paul (USA), E G Ponyatovsky (Russia), A L Ruoff (USA), J S Schilling (USA), O Shimomura (Japan), I F Silvera (USA), B Sundquist (Sweden).
Gathering top experts in the field, the 20th ICPS proceedings reviews the progress in all aspects of semiconductor physics. The proceedings will include state-of-the-art lectures with special emphasis on exciting new developments. It should serve as excellent material for researchers in this and related fields.
This monograph, which is the outcome of the ASI on High Pressure Chemistry, Biochemistry, and Materials Science, illustrates new developments in the field of high pressure science. In fact, for chemists, biochemists, and materials scientists, pressure as an experimental variable represents a tool which provides unique information about systems of materials studied. It is interesting to note how the growth of the high pressure field is also reflected in the content of the recent ASI's dealing with this field. The ASI High Pressure Chemistry held in 1977 was followed by the ASI High Pressure Chemistry and Biochemistry held in 1986, and the coverage of the present ASI also includes applications to materials science. In view of the teaching character of the ASI, it is natural that main contributions to this volume present overviews of the different subfields or applications of high pressure research. In contrast, contributed papers offer more specialized aspects of various high pressure studies. The various contributions to this volume make clear the impressive range of fundamental and applied problems that can be studied by high pressure techniques, and also point towards a major growth of high pressure science and technology in the near future. This ASI focused mainly on advances achieved in the six years since the previous ASI devoted to the high pressure field. The organization of this volume is as follows.
A union list of serials commencing publication after Dec. 31, 1949.
High magnetic fields have been an important tool in semiconductor physics for a long time. The area has been growing very rapidly since quantum effects in silicon field-effect transistors have become of practical interest. Since the discovery of the quantum Hall effect by Klaus von Klitzing in 1980, this subject has grown exponentially. The book contains 42 invited papers and 37 contributed papers which were presented at the 7th of the traditional Würzburg conferences. For the area of high magnetic fields applied in semiconductor physics recent results are discussed, and the state-of-the-art is reviewed. More than 50% of the papers concern two-dimensional electronic systems. Other subjects of current interest are magneto-optics and magneto transport in three-dimensional semiconductors. Special attention has been paid to the rapidly growing field of semimagnetic semiconductors.
These books presents a wide spectrum of research and development activities in the field of High Pressure Science and Technology. These book provide comprehensive and interdisciplinary descriptions of recent research accomplishments in the biological, chemical, Earth, materrals, physical, physiological and related sciences.