Download Free Plasma Source Ion Implantation Research Laboratory University Of Wisconsin Book in PDF and EPUB Free Download. You can read online Plasma Source Ion Implantation Research Laboratory University Of Wisconsin and write the review.

Features the Plasma Source Ion Implantation (PSII) Research Laboratory, part of the Department of Nuclear Engineering and Engineering Physics at the University of Wisconsin at Madison. Posts contact information via mailing address and telephone and fax numbers. Contains information on ion implantation and the Laboratory facilities. Lists PSII publications and faculty members.
Plasma Source Ion Implantation research at Los Alamos Laboratory includes direct investigation of the plasma and materials science involved in target surface modification, numerical simulations of the implantation process, and supporting hardware engineering. Target materials of Al, Cr, Cu-Zn, Mg, Ni, Si, Ti, W, and various Fe alloys have been processed using plasmas produced from Ar, NH3, N2, CH4, and C2H2 gases. Individual targets with surface areas as large as (approximately)4 m2, or weighing up to 1200 kg, have been treated in the large LANL facility. In collaboration with General Motors and the University of Wisconsin, a process has been developed for application of hard, low friction, diamond-like-carbon layers on assemblies of automotive pistons. Numerical simulations have been performed using a 21/2-D particle- in-cell code, which yields time-dependent implantation energy, dose, and angle of arrival for ions at the target surface for realistic geometries. Plasma source development activities include the investigation of pulsed, inductively coupled sources capable of generating highly dissociated N with ion densities n{sub i} (approximately) 1011/cm3, at (approximately)100 W average input power. Cathodic arc sources have also been used to produce filtered metallic and C plasmas for implantation and deposition either in vacuum, or in conjunction with a background gas for production of highly adherent ceramic coatings.
Diamond-like carbon coatings produced by Plasma Source Ion Implantation (PSII) and beamline Ion Beam Assisted Deposition (IBAD) were synthesized and studied. Gas pressure and electrical current were used as variables to design four independent PSII test sets. Beamline IBAD samples were produced with a pre-optimized set of parameters. Profilometry measurements showed the films to have thicknesses between 1.44 +/- 09 and 1.64 +/- 04 microns and to possess very low roughness averages, ranging from 14 +/- 3 to 28 +/- 3 nm, which correlate with substrate surface roughness. Atomic Force Microscopy revealed that diamond-like carbon crystal sizes varied significantly with chamber pressure. Crystals were generally spherical in shape suggesting that films were highly amorphous. Microhardness and nanohardness test results showed the hardest films to be greater than 3 times the hardness of untreated steel. The elastic modulus of the films, measured during the nanohardness test, was directly related to film hardness. Fretting wear and Pin-on-Disk tests were performed to quantitatively assess the ability of films to resist wear. Fretting wear tests showed a dramatic decrease in friction for diamond-like carbon films with friction levels ranging from 10% to 30% of that of untreated steel. Pin-on-Disk tests revealed a significant improvement in wear resistance prior to stylus penetration into the substrate.