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A comprehensive and unique account of the creation of artificially ionized layers in the middle and upper atmosphere, using powerful radio waves. Major physical mechanisms associated with the formation of the ionized region are studied in detail. The main part of the author's research is devoted to problems associated with the breakdown mechanisms for radio frequency discharges in air. A special chapter deals with breakdown in intersecting pulsed beams and the effects of recombination, diffusion and atmospheric winds on the stability of the structure. The kinetics of the plasma produced are also described. The authors examine possibilities of inducing changes in the chemical composition of the upper atmosphere by means of radio frequence heating, with promising effects on the concentration of constituents such as ozone. The feasibility of using this phenomenon for; ozone healing - in connection with the ozone holes in the polar regions is investigated. The text is a timely treatment of key topics in the field of ionospheric modification.
A comprehensive and unique account of the creation of artificially ionized layers in the middle and upper atmosphere, using powerful radio waves. Major physical mechanisms associated with the formation of the ionized region are studied in detail. The main part of the author's research is devoted to problems associated with the breakdown mechanisms for radio frequency discharges in air. A special chapter deals with breakdown in intersecting pulsed beams and the effects of recombination, diffusion and atmospheric winds on the stability of the structure. The kinetics of the plasma produced are also described. The authors examine possibilities of inducing changes in the chemical composition of the upper atmosphere by means of radio frequence heating, with promising effects on the concentration of constituents such as ozone. The feasibility of using this phenomenon for; ozone healing - in connection with the ozone holes in the polar regions is investigated. The text is a timely treatment of key topics in the field of ionospheric modification.
Proceedings of a NATO ARW held in Vimeiro, Portugal, May 11-15, 1992
Specialists in different areas of microwave plasma physics, technique, and plasma processing cover all problems of theory, experiments, and applications of microwave discharges, and yield the state-of-the-art trends.
This text is an introduction to the physics of collisional plasmas, as opposed to plasmas in space. It is intended for graduate students in physics and engineering . The first chapter introduces with progressively increasing detail, the fundamental concepts of plasma physic. The motion of individual charged particles in various configurations of electric and magnetic fields is detailed in the second chapter while the third chapter considers the collective motion of the plasma particles described according to a hydrodynamic model. The fourth chapter is most original in that it introduces a general approach to energy balance, valid for all types of discharges comprising direct current(DC) and high frequency (HF) discharges, including an applied static magnetic field. The basic concepts required in this fourth chapter have been progressively introduced in the previous chapters. The text is enriched with approx. 100 figures, and alphabetical index and 45 fully resolved problems. Mathematical and physical appendices provide complementary information or allow to go deeper in a given subject.
Electric glow discharges (glows) can be found almost everywhere, from atmospheric electricity to modern plasma technologies, and have long been the object of research. The main purpose of this book is to provide simple illustrations of the basic physical mechanisms and principles that determine the properties of electric glow discharges. It should enable readers to successfully participate in scientific and technical progress.
The contrasting examples of microwave plasmas given in this volume demonstrate their capability of not only covering the totality of expressed needs in that particular field, but in many others. For example the ions and reactive neutral species, indispensable for the synergetic effects in etching and deposition processes can be used in metallurgical treatment, and for materials processing in general. They also have the ability to dissociate molecules and excite atoms as required in analytical chemistry where the information on the constituent concentrations is obtained through optical spectroscopy or mass spectrometry. Finally, microwave plasmas can supply the photons for laser and lighting applications. It is noteworthy that microwave plasmas cover an impressive pressure range of eight orders of magnitude from 10-3 Pa (10-5 torr) to above atmospheric pressure. The versatility of microwave plasmas, their moderate cost, and their ease of implementation particularly appeal to the industrial entrepreneur. As well as providing a review of current developments, the work proposes a synthesis on microwave discharges, laying out the corresponding physical references without developing too much plasma theory. It will be of interest both to the user, who may not be overly concerned about plasma science, and to the plasma expert, who may wish to redirect his interest towards plasma applications, such as materials processing.
Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.