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A multispectral imaging method and apparatus adapted for use in determining material properties, especially properties characteristic of abnormal non-dermal cells. A target is illuminated with a narrow band light beam. The target expresses light in response to the excitation. The expressed light is collected and the target's response at specific response wavelengths to specific excitation wavelengths is measured. From the measured multispectral response the target's properties can be determined. A sealed, remote probe and robust components can be used for cervical imaging.
Techniques and Applications of Hyperspectral Image Analysis gives an introduction to the field of image analysis using hyperspectral techniques, and includes definitions and instrument descriptions. Other imaging topics that are covered are segmentation, regression and classification. The book discusses how high quality images of large data files can be structured and archived. Imaging techniques also demand accurate calibration, and are covered in sections about multivariate calibration techniques. The book explains the most important instruments for hyperspectral imaging in more technical detail. A number of applications from medical and chemical imaging are presented and there is an emphasis on data analysis including modeling, data visualization, model testing and statistical interpretation.
Middle ear infections or otitis media that cause inflammation of tympanic membrane and fluid buildup in the middle ear cavity accounts for 2-3 million hospital visits every year [34]. As per an epidemiological study conducted from 2006 - 2016 on 685 children, between the ages of 1-3 years, roughly 60% had at least one hospital visit due to ear infections [3]. Despite the high incidence, the diagnosis of otitis media is only 50% accurate (a coin toss) due to the subjective nature of diagnosis as the physicians look at the ear drum and detect the fluid behind the ear drum. To detect the fluid with high sensitivity and accurately diagnose middle ear infection, we propose a multispectral visible - nIR otoscope that operates in the range of 600 nm - 1050 nm. We have performed experiments to demonstrate the proof of concept of our device on phantoms that includes, 3D printed middle ear structure, tympanic membrane made of silicone, and orange juice as ear fluid all of which mimics the properties of human ear. The multispectral otoscope showed highest contrast between ossicles and fluid at 1000 nm which shows low attenuation of fluid and tympanic membrane at NIR wavelengths. The system is calibrated against a diffuse reflection surface to account for variations in source and detector. Our experiments showed that empty phantoms yielded almost equal contrast across the entire visible- NIR wavelength. Once the fluid is filled, the contrast increased by 30 ± 10 % in the visible wavelength (600 nm - 750 nm) and 120 ± 20 % in nIR wavelength (900 nm - 1000 nm). This 80% - 100% difference in contrast between visible and NIR wavelength is used to detect and highlight the areas of the middle ear filled with fluid.
"This book provides insight into an unconventional modality of imaging where several spectral images are captured by a single snapshot under multi-laser illumination, ensuring high-speed imaging within extremely narrow spectral bands. This method has three distinct advantages, if compared to common commercial multispectral imaging systems - considerably improved spectral selectivity (or colour sensitivity) of imaging, avoided motion artefacts in the spectral image sets, and simpler/faster image processing as integrals over the spectral bands of imaging are replaced by numbers of the fixed working wavelengths. The basic principles and progress in this field are reviewed, focusing on applications for human skin diagnostics and printed forgery detection. The designs of ten different lab-developed prototypes that implement this method are described, along with results of their laboratory, clinical and/or forensic tests. This research leads to the development of new equipment and protocols for better skin diagnostics and the advanced detection of money, document, and artwork forgeries. Chapter 1 explains the basics of spectral imaging, including the main principles of multispectral and hyperspectral imaging. Chapter 2 introduces the snapshot multi-spectral-line imaging (SMSLI) method, focusing on lasers as multi-wavelength illumination sources. Chapter 3 describes multi-laser illumination designs while Chapter 4 presents main specifications of the lab-assembled prototype devices implementing such designs. Results of the test measurements confirming applicability of the developed solutions for analysis/mapping of colour pigments in clinical diagnostics and forgery detection are discussed in Chapters 5 and 6, respectively. This will be a valuable reference for laser and imaging professionals, photonics researchers and engineers, clinicians (dermatologists, plastic surgeons, oncologists), forensic experts, and students of physics, chemistry, biology, medicine, and engineering"--
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Modern high-throughput nanopatterning techniques such as nanoimprint lithography make it possible to fabricate arrays of nanostructures (features with dimensions on the 10’s to 100’s of nm scale) over large area substrates (in2 to m2 scale) such as Si wafers, glass sheets, and flexible roll-to-roll webs. The ability to make such large area nanostructure arrays, or “LNAs” as we will call them, gives birth to an extensive design space enabling a wide array of applications. For instance, LNAs exhibit nanophotonic properties enabling optical devices like wire-grid polarizers (WGPs), transparent conducting metal mesh grids (MMGs), color filters, perfect mirrors, and anti-reflection surfaces. LNAs can also be utilized for increasing surface area as well as generally creating large arrays of discrete features to be utilized as building blocks for electronic components in memory storage devices, sensors, and microprocessors. These unique properties make LNAs immediately attractive to certain industries such as the display and photovoltaic industries. As fabrication methods for LNAs are becoming viable, various industries are becoming interested in pursuing high-volume manufacturing of LNAs for these applications. Unfortunately, metrology methods are currently rudimentary outside of the silicon integrated circuits industry, impeding manufacturing scalability in applications such as displays and photovoltaics. Metrology is essential in the manufacturing context, because it provides invaluable feedback on the success of the fabrication process, both during new process development and large-scale production by tracking of device quality metrics, including performance and reliability metrics, and enables classification of defects that cause devices to not achieve desired quality metrics. Traditional nanometrology methods have fundamental issues which make their applicability to LNA manufacturing difficult. In particular, their low throughput is a major deal-breaker. Fortunately, the nanophotonic properties of LNAs offer a convenient basis for metrology which offers the potential to bridge the gap between the macro and nano scales. This is because the nanophotonic properties of LNAs are inherently geometry dependent, meaning that the optical effects observed from LNAs on the macroscale give direct insight into what is happening on the nanoscale. These optical properties can be characterized using spectral imaging methods such as RGB color imaging, multispectral imaging, and hyperspectral imaging. The throughput of these systems can be extremely high relative to traditional metrology approaches. For instance, a hyperspectral imaging system, when optimized, can achieve throughput of 2.6 m2/hr with 61 spectral bands (wavelength centers of 400 to 700 nm in steps of 5 nm) and a resolution of 10 x 10 μm. An RGB imaging system can achieve an even higher throughput of 15.3 m2/hr. The 10 x 10 μm lateral resolution is often adequate for display and photovoltaic applications. The high throughput makes this approach is incredibly attractive. In this dissertation, we show how spectral imaging techniques can be applied to metrology characterization tasks including defect detection and classification as well as providing a geometric measurement capability via a technique called optical critical dimension (OCD) scatterometry. In this work, we utilize exemplar manufacturing methods, namely JFIL nanoimprint lithography, to create a variety of exemplar LNAs on which we demonstrate the various metrology capabilities of spectral imaging. These LNAs include plasma etched vertical Si nanopillar arrays, metal assisted chemical etching (MACE) vertical Si nanowire arrays, WGPs, and MMGs. Each of these devices has unique manufacturing processes, and we show how the various manufacturing process steps can create a variety of different defects. Naturally, many of the defects originate in the nanoimprint process which lithographically defines the features. We show how defects like particle contamination, non-filling, residual layer thickness (RLT) variations, and adhesion failure uniquely manifest as changes in the optical signatures of the LNAs and use this principle to provide a basis for defect detection. Then, we show how image processing methods can be used to classify what types of defects have occurred over large areas such as wafer scale. Furthermore, we demonstrate that spectral imaging can be used as a geometric metrology using the OCD method, and show how hyperspectral imaging, in particular, can provide geometric measurement on wafer scale areas. The large field of view (FOV), high spatial resolution, and high speed offered by the spectral imaging approach allows for identification of a variety of interesting defect signatures that would be difficult, or nearly impossible, to observe using other metrology approaches. Finally, we discuss ongoing development of a spectral imaging system for roll-to-roll (R2R) LNA manufacturing. Construction of this system will begin in the months following this dissertation and will primarily be applied to manufacturing of WGPs and MMGs on R2R. In summary, these demonstrations are intended to serve as a demonstration of the use of spectral imaging wherever possible in LNA manufacturing. Naturally, this requires that the LNAs being manufacturing exhibit significant enough optical effects for the approach to work, but when this is the case, the advantages of the approach appear outstanding and thus have the potential to be utilized in volume manufacturing of LNAs