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Diffraction and Imaging Techniques in Material Science describes the various methods used to study the atomic structure of matter at an atomic scale based on the interaction between matter and radiation. It classifies the possible methods of observation by making a list of radiations on the basis of wavelength, including ions, X-ray photons, neutrons, and electrons. It also discusses transmission electron microscopy, the weak-beam method of electron microscopy, and some applications of transmission electron microscopy to phase transitions. Organized into 13 chapters, this volume begins with an overview of the kinematic theory of electron diffraction and the ways to treat diffraction by a deformed crystal. It discusses the dynamical theory of diffraction of fast electrons, the treatment of absorption in the dynamical theory of electron diffraction, the use of electron microscopy to study planar interfaces, and analysis of weak-beam images. The book also covers the use of computed electron micrographs in defect identification, crystallographic analysis of dislocation loops containing shear components, and detection and identification of small coherent particles. In addition, the reader is introduced to interpretation of diffuse scattering and short-range order, along with the crystallography of martensitic transformations. The remaining chapters focus on the working principle of the transmission electron microscope, experimental structure imaging of crystals, and the study of diffuse scattering effects originating from substitutional disorder and displacement disorder. The information on diffraction and imaging techniques in material science contained in this book will be helpful to students, researchers, and scientists.
Diffraction and Imaging Techniques in Material Science reviews recent developments in diffraction and imaging techniques used in the study of materials. It discusses advances in high-voltage electron microscopy, low-energy electron diffraction (LEED), X-ray and neutron diffraction, X-ray topography, mirror electron microscopy, and field emission microscopy. Organized into five parts encompassing nine chapters, this volume begins with an overview of the dynamical theory of the diffraction of high-energy electrons in crystals and methodically introduces the reader to dynamical diffraction in perfect and imperfect crystals, inelastic scattering of electrons in crystals, and X-ray production. It then explores back scattering effects, the technical features of high-voltage electron microscopes, and surface characterization by LEED. Other chapters focus on the kinematical theory of X-ray diffraction, techniques and interpretation in X-ray topography, and interpretation of the contrast of the images of defects on X-ray topographs. The book also describes theory and applications of mirror electron microscopy, surface studies by field emission of electrons, field ionization and field evaporation, and gas-surface interactions before concluding with a discussion on lattice imperfections. Scientists and students taking courses on diffraction and solid-state electron microscopy will benefit from this book.
This title is part of UC Press's Voices Revived program, which commemorates University of California Press’s mission to seek out and cultivate the brightest minds and give them voice, reach, and impact. Drawing on a backlist dating to 1893, Voices Revived makes high-quality, peer-reviewed scholarship accessible once again using print-on-demand technology. This title was originally published in 1972.
VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
The Army Materials and Mechanics Research Center of Water town, Massachusetts in cooperation with the Materials Science Group of the Department of Chemical Engineering and Materials Science of Syracuse University has conducted the Sagamore Army Materials Research Conference since 1954. The main purpose of these conferences has been to gather together over 150 scientists and engineers from academic institutions, industry and government who are uniquely qualified to explore in depth a subject of importance to the Department of Defense, the Army and the scientific community. This volume NONDESTRUCTIVE EVALUATION OF MATERIALS, addresses the areas of x-ray, ultrasonics and other methods of nondestructive testing. We wish to acknowledge the dedicated assistance of Joseph M. Bernier of the Army Materials and Mechanics Research Center and Helen Brown DeMascio of Syracuse University throughout the stages of the conference planning and finally the publication of this book. Their help is deeply appreciated. Syracuse University Syracuse, New York The Editors Contents SESSION I X-RAY S. Heissman, Moderator H. K. Herglotz, Moderator 1. Overview of X-Ray Diffraction Methods for Nondestructive Testing • • • • • • • ••• 1 L. V. Azaroff 2. Detection of Fatigue Damage by X-Rays 21 S. Taira and K. Kamachi 3. A Historical Example of Fatigue Damage • • • • • • • 55 H. K. Herglotz 4. The Application of X-Ray Topography to Materials Science . . . . . . . . . . . . . . . . . . . . 69 S. Weissman 5.
A NATO Advanced Study Institute on "Large Scale Integrated Circuits Technology: State of the Art and Prospects" was held at Ettore Majorana Centre for Scientific Culture, Erice (Italy) on July 15-27, 1981, the first course of the International School of Solid-State Device Research. This volume contains the School Proceedings: fundamentals as well as up-to-date information on each subject presented by qualified authors. The material covered in this volume has been arranged in self-consistent chapters. Therefore, the Proceedings may be used as a suitable textbook or authoritative review for research workers and advanced students in the relevant field. The nascent information society is based on advanced technologies which will revolutionize human abilities to manipulate and communicate information. One of the most important underpinnings for developing such an information society lies in innovations in semiconductor microelectronics. Such innova tions, indeed, are dramatically reducing the cost of transmitting, storing, and processing information with improved performance, ushering in an era charac terized by large scale integration -the subject of this book.
Specialist Periodical Reports provide systematic and detailed review coverage of progress in the major areas of chemical research. Written by experts in their specialist fields the series creates a unique service for the active research chemist, supplying regular critical in-depth accounts of progress in particular areas of chemistry. For over 90 years The Royal Society of Chemistry and its predecessor, the Chemical Society, have been publishing reports charting developments in chemistry, which originally took the form of Annual Reports. However, by 1967 the whole spectrum of chemistry could no longer be contained within one volume and the series Specialist Periodical Reports was born. The Annual Reports themselves still existed but were divided into two, and subsequently three, volumes covering Inorganic, Organic and Physical Chemistry. For more general coverage of the highlights in chemistry they remain a 'must'. Since that time the SPR series has altered according to the fluctuating degree of activity in various fields of chemistry. Some titles have remained unchanged, while others have altered their emphasis along with their titles; some have been combined under a new name whereas others have had to be discontinued. The current list of Specialist Periodical Reports can be seen on the inside flap of this volume.