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The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Nineteen experts from the electronics industry, research institutes and universities have joined forces to prepare this book. It does nothing less than provide a complete overview of the electrophysical fundamentals, the present state of the art and applications, as well as the future prospects of microwave tubes and systems. The book does the same for optoelectronics vacuum devices, electron and ion beam devices, light and X-ray emitters, particle accelerators and vacuum interrupters.
This book has grown out of our shared experience in the development of the Stanford Synchrotron Radiation Laboratory (SSRL), based on the electron-positron storage ring SPEAR at the Stanford Linear Accelerator Center (SLAC) starting in Summer, 1973. The immense potential of the photon beam from SPEAR became obvious as soon as experiments using the beam started to run in May, 1974. The rapid growth of interest in using the beam since that time and the growth of other facilities using high-energy storage rings (see Chapters 1 and 3) demonstrates how the users of this source of radiation are finding applications in an increasingly wide variety of fields of science and technology. In assembling the list of authors for this book, we have tried to cover as many of the applications of synchrotron radiation, both realized already or in the process of realization, as we can. Inevitably, there are omissions both through lack of space and because many projects are at an early stage. We thank the authors for their efforts and cooperation in producing what we believe is the most comprehensive treatment of synchrotron radiation research to date.