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This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic
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Learn more about foundational and advanced topics in polymer thin films and coatings besides species with this powerful two-volume resource The two-volume Inorganic and Organic Thin Films: Fundamentals, Fabrication, and Applications delivers a foundational resource for current researchers and commercial users involved in the design and fabrication of thin films. The book offers newcomers to the field a thorough description of new design theory, fabrication methods, and applications of advanced thin films. Readers will discover the physics and chemistry underlying the manufacture of new thin films and coatings in this leading new resource that promises to become a handbook for future applications of the technology. This one-stop reference brings together all important aspects of inorganic and polymeric thin films and coatings, including construction, assembly, deposition, functionality, patterning, and characterization. Explorations of their applications in industries as diverse as information technology, new energy, biomedical engineering, aerospace, and oceanographic engineering round out this fulsome exploration of one of the most exciting and rapidly developing areas of scientific and industrial research today. Readers will also learn from: A comprehensive introduction to the progress of thin films and coatings as well as fundamentals in functional thin films and coatings An exploration of multi-layered magnetic thin films for electron transport control and signal sensing, including giant magnetoresistance, colossal magnetoresistance, tunneling magnetoresistance, and the quantum anomalous Holzer effect An in time summary of high-quality magneto-optics, nanophotonics, spin waves and spintronics using bismuth-substituted iron garnet thin films as examples A thorough discussion of template-assisted fabrication of nanostructure thin films for ultrasensitive detection of chemicals and biomolecules A treatment of biomass derived functional films and coatings Perfect for materials scientists and inorganic chemists, Inorganic and Organic Thin Films will also earn a place in the libraries of solid state physicists and physical chemists working in private industry, as well as polymer and surface chemists who seek to improve their understanding of thin films and coatings.
The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.