Download Free Ferroelectric Thin Films Iii Symposium Held In San Francisco California On April 13 16 1993 Materials Research Society Symposium Proceedings Book in PDF and EPUB Free Download. You can read online Ferroelectric Thin Films Iii Symposium Held In San Francisco California On April 13 16 1993 Materials Research Society Symposium Proceedings and write the review.

This symposium showcased the advancement in processing technology and basic scientific understanding of ferroelectric thin films. The conference highlighted the use of novel materials science analysis techniques to characterize ferroelectric thin film materials and devices and to relate the nanoscale features and responses detected by these techniques to ferroelectric, electrooptic and piezoelectric properties. Examples of newer material analysis techniques included atomic force microscopy, electron spin resonance, high resolution transmission electron microscopy, combined Rutherford backscattering- nuclear reaction analysis and the use of optical interferometry to provide a three dimensional representation of field induced displacement.
Papers of the symposium held April 13-16, 1993 in San Francisco, Calif., on: novel analysis techniques to characterize materials and device properties, process integration, degradation and modelling, CVD, spin pyrolysis, niobium and barium based ferroelectrics, materials and processes, sputter deposition, pulsed laser and other deposition techniques. Annotation copyright by Book News, Inc., Portland, OR
The area of ferroelectric thin films has expanded rapidly recently with the advent of high quality multi-oxide deposition technology. Advances in thin film quality has resulted in the realization of new technologies not achievable through classical bulk ceramic processing techniques. An example of this progress is the co-processing of ferroelectric thin films with standard semiconductor silicon and GaAs integrated circuits for radiation hard, non- volatile memory products. While the development of this class of products is still embryonic, the forecasted market potential is rapidly out distancing the combined developmental effort. Historically the greatest use of bulk ferroelectric material has been in sensor technology, utilizing the pyroelectric and piezoelectric properties of the material. By comparison, a relatively small development effort has been reported for ferroelectric thin film sensor technology, a field sure to provide exciting advances in the future.
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