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Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Ellipsometry is the method of choice to determine the properties of surfaces and thin films. It provides comprehensive and sensitive characterization in contactless and non-invasive measurements. This book gives a state-of-the-art survey of ellipsometric investigations of organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. In conjunction with the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices and fabrication advances, the ellipsometric analysis of their optical and material properties has progressed rapidly in the recent years.
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.
This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.
This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.
A one-stop, concise guide on determining and measuring thin film thickness by optical methods. This practical book covers the laws of electromagnetic radiation and interaction of light with matter, as well as the theory and practice of thickness measurement, and modern applications. In so doing, it shows the capabilities and opportunities of optical thickness determination and discusses the strengths and weaknesses of measurement devices along with their evaluation methods. Following an introduction to the topic, Chapter 2 presents the basics of the propagation of light and other electromagnetic radiation in space and matter. The main topic of this book, the determination of the thickness of a layer in a layer stack by measuring the spectral reflectance or transmittance, is treated in the following three chapters. The color of thin layers is discussed in chapter 6. Finally, in chapter 7, the author discusses several industrial applications of the layer thickness measurement, including high-reflection and anti-reflection coatings, photolithographic structuring of semiconductors, silicon on insulator, transparent conductive films, oxides and polymers, thin film photovoltaics, and heavily doped silicon. Aimed at industrial and academic researchers, engineers, developers and manufacturers involved in all areas of optical layer and thin optical film measurement and metrology, process control, real-time monitoring, and applications.
This book offers a genuinely practical introduction to the most commonly encountered optical and non-optical systems used for the metrology and characterization of surfaces, including guidance on best practice, calibration, advantages and disadvantages, and interpretation of results. It enables the user to select the best approach in a given context. Most methods in surface metrology are based upon the interaction of light or electromagnetic radiation (UV, NIR, IR), and different optical effects are utilized to get a certain optical response from the surface; some of them record only the intensity reflected or scattered by the surface, others use interference of EM waves to obtain a characteristic response from the surface. The book covers techniques ranging from microscopy (including confocal, SNOM and digital holographic microscopy) through interferometry (including white light, multi-wavelength, grazing incidence and shearing) to spectral reflectometry and ellipsometry. The non-optical methods comprise tactile methods (stylus tip, AFM) as well as capacitive and inductive methods (capacitive sensors, eddy current sensors). The book provides: Overview of the working principles Description of advantages and disadvantages Currently achievable numbers for resolutions, repeatability, and reproducibility Examples of real-world applications A final chapter discusses examples where the combination of different surface metrology techniques in a multi-sensor system can reasonably contribute to a better understanding of surface properties as well as a faster characterization of surfaces in industrial applications. The book is aimed at scientists and engineers who use such methods for the measurement and characterization of surfaces across a wide range of fields and industries, including electronics, energy, automotive and medical engineering.
Peptides and Proteins as Biomaterials for Tissue Regeneration and Repair highlights the various important considerations that go into biomaterial development, both in terms of fundamentals and applications. After covering a general introduction to protein and cell interactions with biomaterials, the book discusses proteins in biomaterials that mimic the extracellular matrix (ECM). The properties, fabrication and application of peptide biomaterials and protein-based biomaterials are discussed in addition to in vivo and in vitro studies. This book is a valuable resource for researchers, scientists and advanced students interested in biomaterials science, chemistry, molecular biology and nanotechnology. - Presents an all-inclusive and authoritative coverage of the important role which protein and peptides play as biomaterials for tissue regeneration - Explores protein and peptides from the fundamentals, to processing and applications - Written by an international group of leading biomaterials researchers