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The subject of surface physics has now grown to become an exciting interdisciplinary field of research with important practical applications.The purpose of this book is to provide a guided tour of some recent advances, key research issues and approaches in electronic processes at solid surfaces.Apart from a few structural studies, selected topics have been chosen to illustrate the dynamical response of the solid surface to external probes, with the main emphasis on electron transfer phenomena.
Expanding on the ideas first presented in Gerhard Ertl's acclaimed Baker Lectures at Cornell University, Reactions at Solid Surfaces comprises an authoritative, self-contained, book-length introduction to surface reactions for both professional chemists and students alike. Outlining our present understanding of the fundamental processes underlying reactions at solid surfaces, the book provides the reader with a complete view of how chemistry works at surfaces, and how to understand and probe the dynamics of surface reactions. Comparing traditional surface probes with more modern ones, and bringing together various disciplines in a cohesive manner, Gerhard Ertl's Reactions at Solid Surfaces serves well as a primary text for graduate students in introductory surface science or chemistry, as well as a self-teaching resource for professionals in surface science, chemical engineering, or nanoscience.
Elementary Processes in Excitations and Reactions on Solid Surfaces explores the fundamental nature of dynamics on solid surfaces. Attempts are made to reveal various aspects of elementary processes in excitations and reactions on solid surfaces by recent theoretical and experimental developments of the subjects such as molecular beams interacting with surfaces, ion beam scattering, laser-induced dynamical processes, electronically induced dynamical processes, and optical properties of solid surfaces. This volume is devided into three parts. Part I is concerned mainly with the rich reaction dynamics on potential-energy surfaces. Part II is devoted to the interplay of excitations. In Part III, new and rapidly developing methods are introduced.
Principles of Adsorption and Reaction on Solid Surfaces As with other books in the field, Principles of Adsorption and Reaction on Solid Surfaces describes what occurs when gases come in contact with various solid surfaces. But, unlike all the others, it also explains why. While the theory of surface reactions is still under active development, the approach Dr. Richard Masel takes in this book is to outline general principles derived from thermodynamics and reaction rate theory that can be applied to reactions on surfaces, and to indicate ways in which these principles may be applied. The book also provides a comprehensive treatment of the latest quantitative surface modeling techniques with numerous examples of their use in the fields of chemical engineering, physical chemistry, and materials science. A valuable working resource and an excellent graduate-level text, Principles of Adsorption and Reaction on Solid Surfaces provides readers with: * A detailed look at the latest advances in understanding and quantifying reactions on surfaces * In-depth reviews of all crucial background material * 40 solved examples illustrating how the methods apply to catalysis, physical vapor deposition, chemical vapor deposition, electrochemistry, and more * 340 problems and practice exercises * Sample computer programs * Universal plots of many key quantities * Detailed, class-tested derivations to help clarify key results The recent development of quantitative techniques for modeling surface reactions has led to a number of exciting breakthroughs in our understanding of what happens when gases come in contact with solid surfaces. While many books have appeared describing various experimental modeling techniques and the results obtained through their application, until now, there has been no single-volume reference devoted to the fundamental principles governing the processes observed. The first book to focus on governing principles rather than experimental techniques or specific results, Principles of Adsorption and Reaction on Solid Surfaces provides students and professionals with a quantitative treatment of the application of principles derived from the fields of thermodynamics and reaction rate theory to the investigation of gas adsorption and reaction on solid surfaces. Writing for a broad-based audience including, among others, chemical engineers, chemists, and materials scientists, Dr. Richard I. Masel deftly balances basic background in areas such as statistical mechanics and kinetics with more advanced applications in specialized areas. Principles of Adsorption and Reaction on Solid Surfaces was also designed to provide readers an opportunity to quickly familiarize themselves with all of the important quantitative surface modeling techniques now in use. To that end, the author has included all of the key equations involved as well as numerous real-world illustrations and solved examples that help to illustrate how the equations can be applied. He has also provided computer programs along with universal plots that make it easy for readers to apply results to their own problems with little computational effort. Principles of Adsorption and Reaction on Solid Surfaces is a valuable working resource for chemical engineers, physical chemists, and materials scientists, and an excellent text for graduate students in those disciplines.
The emission of electrons from solid surfaces bombarded by slow neutral and ionized heavy particles (atoms, molecules) is reviewed both theoretically and in the light of recent experimental studies by leading groups in the field. The book integrates physics of ion beams, surfaces and chemical physics, and serves both as a reference work for researchers and a textbook for graduate students.
The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.· Unified approach to the description of numerous physico-chemical phenomena in different materials· Based on the pioneering research work of the authors· Explantion of a variety of experimental observations· Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed
Molecular surface science has made enormous progress in the past 30 years. The development can be characterized by a revolution in fundamental knowledge obtained from simple model systems and by an explosion in the number of experimental techniques. The last 10 years has seen an equally rapid development of quantum mechanical modeling of surface processes using Density Functional Theory (DFT). Chemical Bonding at Surfaces and Interfaces focuses on phenomena and concepts rather than on experimental or theoretical techniques. The aim is to provide the common basis for describing the interaction of atoms and molecules with surfaces and this to be used very broadly in science and technology. The book begins with an overview of structural information on surface adsorbates and discusses the structure of a number of important chemisorption systems. Chapter 2 describes in detail the chemical bond between atoms or molecules and a metal surface in the observed surface structures. A detailed description of experimental information on the dynamics of bond-formation and bond-breaking at surfaces make up Chapter 3. Followed by an in-depth analysis of aspects of heterogeneous catalysis based on the d-band model. In Chapter 5 adsorption and chemistry on the enormously important Si and Ge semiconductor surfaces are covered. In the remaining two Chapters the book moves on from solid-gas interfaces and looks at solid-liquid interface processes. In the final chapter an overview is given of the environmentally important chemical processes occurring on mineral and oxide surfaces in contact with water and electrolytes. - Gives examples of how modern theoretical DFT techniques can be used to design heterogeneous catalysts - This book suits the rapid introduction of methods and concepts from surface science into a broad range of scientific disciplines where the interaction between a solid and the surrounding gas or liquid phase is an essential component - Shows how insight into chemical bonding at surfaces can be applied to a range of scientific problems in heterogeneous catalysis, electrochemistry, environmental science and semiconductor processing - Provides both the fundamental perspective and an overview of chemical bonding in terms of structure, electronic structure and dynamics of bond rearrangements at surfaces
Recent advances in ultrashort pulsed laser technology have opened new frontiers in atomic, molecular and optical sciences. The 12th International Conference on Multiphoton Processes (ICOMP12) and the 3rd International Conference on Attosecond Physics (ATTO3), held jointly in Sapporo, Japan, during July 3-8, showcased studies at the forefront of research on multiphoton processes and attosecond physics. This book summarizes presentations and discussions from these two conferences.
This volume is the proceedings of the Seventh Taniguchi International Sympo sium on the Theory of Condensed Matter. The symposium was held for five days from September 10 to 14, 1984 at Kashikojima, Mie, Japan. Dynamical proces ses and ordering on solid surfaces are the subjects of the symposium. About twenty participants stayed together at Shima Kanko Hotel, the symposium site, during the period. The intense and productive discussion in the bright sea s ide atmosphere of Kashi koj ima is bel i eved to have been impress i ve to all the participants. Dynamical processes on solid surfaces are the target of recent theoreti cal efforts in surface physics. Even if some of them are still in their in fant stage, important aspects begin to appear and vital concepts start to shape themselves. Some topics in the symposium were the energy transfer re lated with internal degrees of freedom of molecules, attempts to go beyond the trajectory approximati on, charge transfer and energy transfer between particles and solid surfaces, and related fundamental problems like adiaba tic potentials and electronic structures. In particular, really actively di scussed was the time-dependent Newns-Anderson model wi thout and wi th the intraatomic Coulomb interaction and sometimes with the interaction to the surface plasmons or phonons. Surface effects on the optical processes were discussed with great interest, such as the ABC-related problems of exciton polaritons and rare gas adsorbates on metal surfaces.
"Hands are useless if there are no eyes to see what is obvious." -M. V. Lomonosov Dear Reader, I invite you to open this book and step on the semiconductor surface, where the processes that form the subject of the book come into play. The surface of the semiconductor is attracting more and more interest among researchers, in fact researchers in two different fields. These are notably the physicists and engineers engaged in research in semi conductor physics and the making of semiconductor devices. The entire industry of semiconductor instruments hinges on the problem of the surface. The quality of semiconductor devices, whose use is growing steadily, depends essentially on the properties of the surface. The instability of these properties and their uncon trollable alterations with temperature and under the influence of environmental conditions result in a lack of stability in the performance of semiconductor devices, hence the high percentage of waste in their industrial production. The methods used in factory laboratories to prevent such waste are largely empirical. The properties of the surface, the nature of the physicochemical processes that take place on it, and the role of environmental factors still remain obscure. A major task of the semiconductor industry is to learn to control the properties of the surface.