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The book provides a comprehensive guide to the construction, operation, diagnostics, and applications of electron impact ion sources for the production of highly charged ions. Beside the treatment of elementary processes and ion storage in electron impact ion sources, characteristic diagnostic methods for these sources are described which are related to plasma diagnostics. Related to atomic and solid state physics the use of electron impact ion sources is discussed. Diese Monographie behandelt den Aufbau, den Betrieb, die Diagnostik und Anwendungen von Elektronenstoß-Ionenquellen zur Erzeugung hochgeladener Ionen. Neben der Behandlung von Basisprozessen in den Quellen erfolgt eine umfangreiche Beschreibung von Diagnostikmethoden mit Relevanz zur Ionenquellen- und Plasmadiagnostik.
It is arguable that most of chemistry and a large portion of atomic physics is concemed with the behaviour of the 92 naturally occurring elements in each of 3 charge states (+1, 0, -1); 276 distinct species. The world of multiply and highly charged ions provides a further 4186 species for us to study. Over 15 times as many! It is the nature of human beings to explore the unknown. This nature is par ticularly strong in physicists although this may not be readily apparent because theses explorations are undertaken in somewhat abstract 'spaces'. It is, then, no surprise that we have begun to explore the realm of multiply and highly charged ions. Over the past few decades, a consistent1y high quality body of work has emerged as the fruits of this exploration. This intemationally based subject, pursued in universities and research laboratories worldwide, has ex panded beyond its roots in atomic physics. We now see it embracing elements of surface science, nuclear physics and plasma physics as well as drawing on a wide range of technologies. This speciality offers new tests of some of our most fundamental ideas in physics and simultaneously new medical cures, new ways of fabricating electronic gadgets, a major hope for clean sustainable energy and explanations for astrophysical phenomena. It is both a deeply fundamental and a widely applicable area of investigation.
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
This book contains the invited lectures and contributed papers presented at the V International Conference on the Physics of Highly Charged Ions, which was held at the lustus-Liebig-Universi tat Giessen, 10-14 September 1990. This conference was the ftfth in a series -after Stockholm (1982), Oxford (1984), Groningen (1986) and Grenoble (1988) -to deal with a rapidly growing fteld, which comprises the spectroscopy of highly charged ions and their interactions with photons, electrons, atoms, ions, and solids. Most of the matter of the universe is in the ionized state. Investigations dealing with hot plasmas on earth have been greatly furthered by thermonuclear-fusion research. The increasing maturity of this programme has revealed the fundamental role of highly charged ions in fusion plasmas. Today, it is clear that a detailed knowledge of the production mechanisms of highly charged ions and their interactions with other plasma constituents is an important prerequisite for a better understanding of the microscopic and macroscopic plasma properties. The study of highly charged ions involves various branches of physics. It was the aim of the conference to bring together physicists working in atomic collisions and spectroscopy, in plasma physics and astrophysics, as well as in solid-state and ion-source physics. About 220 scientists from 20 nations attended the conference, indicating the strong worldwide interest and the vital ity of research in this fteld.
This book provides and elementary introduction to the field of trapping highly charged ions. The first group of chapters is intended to describe the various sorts of highly charged ion traps: EBIT, EBIS, ECR, Storage Rings and various speciality traps. The authors focus on their own ion trap facilities in order to teach by example. The chapters range in scope from comprehensive reviews to brief introductions. The second group of chapters is intended to give a flavour of the various sorts of scientific research which are presently being carried out with traps for highly charged ions. These chapters not only inform, but also stimulate newcomers to think up fresh ideas. The articles in this second group generally fall into one of three broad categories: atomic structure experiments, ion-surface interactions and precision mass spectrometry. The third group of chapters is intended to deal with theory and spectroscopic analysis. It provides some of the background material necessary to make sense of observed phenomenology, to allow detailed explanation of experimental data, and to sensibly plan further experimentation. An appendix provides a complete keyword-annotated bibliography of pa
Measurements of multi-charged heavy ions produced in an Electron Beam Ion Source (EBIS) were carried out with a test model ion source 20 cm in length. This test model utilized an electron gun placed external to the bore of the focusing solenoid in order to achieve electrostatically focussed electron beams and isolation of the vacuum surrounding the electron gun from the vacuum in the ionization region within the solenoid bore. An ultrahigh vacuum system utilizing liquid nitrogen (77°K) cryopumping was used to achieve the low pressures needed in the ionization region for the operation of this ion source. Several technical problems limited the operation of this test model and prevented a thorough investigation of the ionization processes in the ion source, but the experimental results have shown qualitative agreement with the theoretical calculations for the operation of this type of ion source. Even with the problems of an insufficient vacuum and electron beam focussing field, measurable currents of C/sup +5/ and A/sup +8/ ions were produced. The present experimental results suggest that the approach taken in this work of using an external electron gun and cryopumping in the EBIS to achieve the large electron beam current density and low vacuum necessary for successful operation is a viable one. Such an ion source can be used to create highly-charged heavy ions for injection into a cyclotron or other type of particle accelerator.