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Increasing the awareness of the connection between physics and practical electrical problem solving is the main aim of this book. It achieves this by making the connection between fundamental physics and some of the most common practical electronic problems which engineers encounter. Other books tend to treat topics in isolation rather than compining them together in order to solve a real-life problem. Each chapter is of this unique book ends with further problems and fully worked solutions to help the student understand. The book contains seven selective topics which can be studied in isolation, such as Fibre Optic Technology and Electromagnetic Conduction. Mathematical theory is kept to a minimun; only the necessary equations required to solve the problems are presented, but each symbol presented in clearly defined. Provides both theoretical and practical problems Includes several graded problems Suitable for foundation level students and undergraduates embarking on an electrical or electronic engineering course
Describing the fundamental physical properties of materials used in electronics, the thorough coverage of this book will facilitate an understanding of the technological processes used in the fabrication of electronic and photonic devices. The book opens with an introduction to the basic applied physics of simple electronic states and energy levels. Silicon and copper, the building blocks for many electronic devices, are used as examples. Next, more advanced theories are developed to better account for the electronic and optical behavior of ordered materials, such as diamond, and disordered materials, such as amorphous silicon. Finally, the principal quasi-particles (phonons, polarons, excitons, plasmons, and polaritons) that are fundamental to explaining phenomena such as component aging (phonons) and optical performance in terms of yield (excitons) or communication speed (polarons) are discussed.
Cover -- VOLUME I -- Half Title -- Title Page -- Copyright Page -- Table of Contents -- Preface -- Author -- A -- B -- C -- D -- E -- F -- G -- Index of Names -- Index of Subjects -- VOLUME II -- Half Title -- Title Page -- Copyright Page -- Table of Contents -- Preface -- Author -- H -- I -- J -- K -- L -- M -- N -- O -- Index of Names -- Index of Subjects -- VOLUME III -- Half Title -- Title Page -- Copyright Page -- Table of Contents -- Preface -- Author -- P -- Q -- R -- S -- T -- U -- V -- W -- X -- Y -- Z -- Appendix A -- Appendix B -- Appendix C -- Index of Names -- Index of Subjects
Covers the basic principles and theories of engineering physics and offers a balance between theoretical concepts and their applications. It is designed as a textbook for an introductory course in engineering physics. Beginning with a comprehensive discussion on oscillations and waves with applications in the field of mechanical and electrical engineering, it goes on to explain the basic concepts such as Huygen's principle, Fresnel's biprism, Fraunhofer diffraction and polarization. Emphasis has been given to an understanding of the basic concepts and their applications to a number of engineering problems. Each topic has been discussed in detail, both conceptually and mathematically. Pedagogical features including solved problems, unsolved exercised and multiple choice questions are interspersed throughout the book. This will help undergraduate students of engineering acquire skills for solving difficult problems in quantum mechanics, electromagnetism, nanoscience, energy systems and other engineering disciplines.
This text provides an introduction to the important physics underpinning current technologies, highlighting key concepts in areas that include linear and rotational motion, energy, work, power, heat, temperature, fluids, waves, and magnetism. This revision reflects the latest technology advances, from smart phones to the Internet of Things, and all kinds of sensors. The author also provides more modern worked examples with useful appendices and laboratories for hands-on practice. There are also two brand new chapters covering sensors as well as electric fields and electromagnetic radiation as applied to current technologies.
The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.
Circuit Fundamentals. -- AC Circuits. -- Diode Applications. -- Semiconductor Diodes and Transistors. -- Practical Amplifier Circuits. -- Operational Amplifiers. -- Digital Electronics. -- The Digital Computer. -- Digital Systems.
This text aims to provide the fundamentals necessary to understand semiconductor device characteristics, operations and limitations. Quantum mechanics and quantum theory are explored, and this background helps give students a deeper understanding of the essentials of physics and semiconductors.
Physics of Optoelectronics focuses on the properties of optical fields and their interaction with matter. Understanding that lasers, LEDs, and photodetectors clearly exemplify this interaction, the author begins with an introduction to lasers, LEDs, and the rate equations, then describes the emission and detection processes. The book summarizes and reviews the mathematical background of the quantum theory embodied in the Hilbert space. These concepts highlight the abstract form of the linear algebra for vectors and operators, supplying the "pictures" that make the subject more intuitive. A chapter on dynamics includes a brief review of the formalism for discrete sets of particles and continuous media. It also covers the quantum theory necessary for the study of optical fields, transitions, and semiconductor gain. This volume supplements the description of lasers and LEDs by examining the fundamental nature of the light that these devices produce. It includes an analysis of quantized electromagnetic fields and illustrates inherent quantum noise in terms of Poisson and sub-Poisson statistics. It explains matter-light interaction in terms of time-dependent perturbation theory and Fermi's golden rule, and concludes with a detailed discussion of semiconductor emitters and detectors.
The book presents an in-depth review and analysis of Silicon Carbide device processing. The main topics are: (1) Silicon Carbide Discovery, Properties and Technology, (2) Processing and Application of Dielectrics in Silicon Carbide Devices, (3) Doping by Ion Implantation, (4) Plasma Etching and (5) Fabrication of Silicon Carbide Nanostructures and Related Devices. The book is also suited as supplementary textbook for graduate courses. Keywords: Silicon Carbide, SiC, Technology, Processing, Semiconductor Devices, Material Properties, Polytypism, Thermal Oxidation, Post Oxidation Annealing, Surface Passivation, Dielectric Deposition, Field Effect Mobility, Ion Implantation, Post Implantation Annealing, Channeling, Surface Roughness, Dry Etching, Plasma Etching, Ion Etching, Sputtering, Chemical Etching, Plasma Chemistry, Micromasking, Microtrenching, Nanocrystal, Nanowire, Nanotube, Nanopillar, Nanoelectromechanical Systems (NEMS).