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X-ray photoelectron spectroscopy (XPS) has become a standard practice technique, and automated XPS facilities can be found in industry and in universities all over the world. This transformed XPS from an advanced characterization method for dedicated research, to a rather standard analysis technique of surface analysis. The catalyst's surface state is probably the most prominent factor that influences the catalytic performance. It is therefore no surprise that XPS has become an indispensable tool in studies of solid catalysts. It has been directly used to investigate issues such as the surface composition of the active catalyst and reaction and deactivation mechanisms.The objective of this book is to provide a comprehensive overview of the current status and future perspectives of X-ray photoelectron spectroscopy dedicated to catalytic applications, including thermal catalysis, electrocatalysis, and photo(electro)catalysis. The book contains 13 chapters, starting with the necessary introduction of the technique background, including basic phenomena and instrumentation aspects. The second part of the book focuses on the presentation of long-established applications of the technique, such as XPS studies of model catalysts. Finally, the book describes relatively recent developments of this method for cutting-edge surface characterization mainly using synchrotron X-ray radiation.
"XPS has become a mature technique and automated XPS facilities can be found in industry and in universities all over the world. This transformed XPS from an advanced characterization method for dedicated research, to a rather standard analysis technique of surface analysis. The catalyst's surface state is probably the most prominent factor that influences the catalytic performance. It is therefore no surprise that XPS has become an indispensable tool in studies of solid catalysts. It has been directly used to investigate issues such as the surface composition of the active catalyst and the reaction and deactivation mechanisms. Several excellent essays describe in detail the theoretical and practical aspects of X-ray photoelectron spectroscopy. The objective of the book is to provide a comprehensive overview of the current status and future perspectives of X-ray photoelectron spectroscopy dedicated to catalytic applications, including thermal catalysis, electrocatalysis, and photo(electro)catalysis. The book contains 13 chapters, starting with the necessary introduction of the technique background, including basic phenomena and instrumentation aspects. The second part of the book focuses on the presentation of long-established applications of the technique such as XPS studies of model catalysts. In the last part, the book describes relatively recent developments of this method for cutting edge surface characterization mainly using synchrotron X-ray radiation"--
Heterogeneous catalysis has developed over the past two centuries as a technology driven by the needs of society, and is part of Nobel Prize-winning science. This book describes the spectacular increase in molecular understanding of heterogenous catalytic reactions in important industrial processes. Reaction mechanism and kinetics are discussed with a unique focus on their relation with the inorganic chemistry of the catalyst material. An introductory chapter presents the development of catalysis science and catalyst discovery from a historical perspective. Five chapters that form the thrust of the book are organized by type of reaction, reactivity principles, and mechanistic theories, which provide the scientific basis to structure-function relationships of catalyst performance. Present-day challenges to catalysis are sketched in a final chapter. Written by one of the world's leading experts on the topic, this definitive text is an essential reference for students, researchers and engineers working in this multibillion-dollar field.
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Accessible references for researchers and industrialists in this exciting field, covering both developments and applications of catalysis.
This completely updated and revised second edition of Surface Analysis: The Principal Techniques, deals with the characterisation and understanding of the outer layers of substrates, how they react, look and function which are all of interest to surface scientists. Within this comprehensive text, experts in each analysis area introduce the theory and practice of the principal techniques that have shown themselves to be effective in both basic research and in applied surface analysis. Examples of analysis are provided to facilitate the understanding of this topic and to show readers how they can overcome problems within this area of study.
Until comparatively recently, trace analysis techniques were in general directed toward the determination of impurities in bulk materials. Methods were developed for very high relative sensitivity, and the values determined were average values. Sampling procedures were devised which eliminated the so-called sampling error. However, in the last decade or so, a number of developments have shown that, for many purposes, the distribution of defects within a material can confer important new properties on the material. Perhaps the most striking example of this is given by semiconductors; a whole new industry has emerged in barely twenty years based entirely on the controlled distribu tion of defects within what a few years before would have been regarded as a pure, homogeneous crystal. Other examples exist in biochemistry, metallurgy, polyiners and, of course, catalysis. In addition to this of the importance of distribution, there has also been a recognition growing awareness that physical defects are as important as chemical defects. (We are, of course, using the word defect to imply some dis continuity in the material, and not in any derogatory sense. ) This broadening of the field of interest led the Materials Advisory Board( I} to recommend a new definition for the discipline, "Materials Character ization," to encompass this wider concept of the determination of the structure and composition of materials. In characterizing a material, perhaps the most important special area of interest is the surface.