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This manual is a useful ready-reference guide to the analytical power of modern X-ray scattering in the field of soft matter. The author describes simple tools that can elucidate the mechanisms of structure evolution in the studied materials, and follows this up with a step-by-step guide to more advanced methods. Data analysis based on clear, unequivocal results is rendered simple and straightforward – with a stress on careful planning of experiments and adequate recording of all required data.
During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers.
X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, and more.
The properties of soft-matter thin films (e.g. liquid films, polymer coatings, Langmuir-Blodgett multilayers) nowadays play an important role in materials science. They are also very exciting with respect to fundamental questions: In thin films, liquids and polymers may be considered as trapped in a quasi-two-dimensional geometry. This confined geometry is expected to alter the properties and structures of these materials considerably. This volume is dedicated to the scattering of x-rays by soft-matter interfaces. X-ray scattering under grazing angles is the only tool to investigating these materials on atomic and mesoscopic length scales. A review of the field is presented with many examples.
With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
X-ray diffraction crystallography for powder samples is a well-established and widely used method. It is applied to materials characterization to reveal the atomic scale structure of various substances in a variety of states. The book deals with fundamental properties of X-rays, geometry analysis of crystals, X-ray scattering and diffraction in polycrystalline samples and its application to the determination of the crystal structure. The reciprocal lattice and integrated diffraction intensity from crystals and symmetry analysis of crystals are explained. To learn the method of X-ray diffraction crystallography well and to be able to cope with the given subject, a certain number of exercises is presented in the book to calculate specific values for typical examples. This is particularly important for beginners in X-ray diffraction crystallography. One aim of this book is to offer guidance to solving the problems of 90 typical substances. For further convenience, 100 supplementary exercises are also provided with solutions. Some essential points with basic equations are summarized in each chapter, together with some relevant physical constants and the atomic scattering factors of the elements.
Small-angle scattering of X rays and neutrons is a widely used diffraction method for studying the structure of matter. This method of elastic scattering is used in various branches of science and technology, includ ing condensed matter physics, molecular biology and biophysics, polymer science, and metallurgy. Many small-angle scattering studies are of value for pure science and practical applications. It is well known that the most general and informative method for investigating the spatial structure of matter is based on wave-diffraction phenomena. In diffraction experiments a primary beam of radiation influences a studied object, and the scattering pattern is analyzed. In principle, this analysis allows one to obtain information on the structure of a substance with a spatial resolution determined by the wavelength of the radiation. Diffraction methods are used for studying matter on all scales, from elementary particles to macro-objects. The use of X rays, neutrons, and electron beams, with wavelengths of about 1 A, permits the study of the condensed state of matter, solids and liquids, down to atomic resolution. Determination of the atomic structure of crystals, i.e., the arrangement of atoms in a unit cell, is an important example of this line of investigation.
The production of multi layered thin films with sufficient reliability is a key technology for device fabrication in micro electronics. In the Co/Cu type multi layers, for example, magnetoresistance has been found as large as 80 % at 4. 2 K and 50 % at room temperature. In addition to such gigantic mag netoresistance, these multi layers indicate anti ferromagnetic and ferromag netic oscillation behavior with an increase in the thickness of the layers of the non magnetic component. These interesting properties of the new synthetic flmctional materials are attributed to their periodic and interracial structures at a microscopic level, although the origin of such peculiar features is not fully understood. Information on the surface structure or the number density of atoms in the near surface region may provide better insight. Amorphous alloys, frequently referred to as metallic glasses, are produced by rapid quenching from the melt. The second generation amorphous alloys, called "bulk amorphous alloys", have been discovered in some Pd based and Zr based alloy systems, with a super cooled liquid region at more than 120 K. In these alloy systems, one can obtain a sample thickness of several centime ters. Growing scientific and technological curiosity about the new amorphous alloys has focused on the fundamental factors, such as the atomic scale struc ture, which are responsible for the thermal stability with certain chemical compositions.
This book presents a practical guide to the analysis of materials and includes a thorough description of the underlying theories and instrumental aberrations caused by real experiments. The main emphasis concerns the analysis of thin films and multilayers, primarily semiconductors, although the techniques are very general. Semiconductors can be very perfect composite crystals and therefore their study can lead to the largest volume of information, since X-ray scattering can assess the deviation from perfection.The description is intentionally conceptual so that the reader can grasp the real processes involved. In this way the analysis becomes significantly easier, making the reader aware of misleading artifacts and assisting in the determination of a more complete and reliable analysis. The theory of scattering is very important and is covered in such a way that the assumptions are clear. Greatest emphasis is placed on the dynamical diffraction theory including new developments extending its applicability to reciprocal space mapping and modelling samples with relaxed and distorted interfaces.A practical guide to the measurement of diffraction patterns, including the smearing effects introduced to the measurement, is also presented.
This book provides the basic theoretical background for X-ray and neutron scattering experiments. Since these techniques are increasingly being used by biologists and chemists, as well as physicists, the book is intended to be accessible to a broad spectrum of scientists.