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With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.
X-ray diffraction is a useful and powerful analysis technique for characterizing crystalline materials commonly employed in MSE, physics, and chemistry. This informative new book describes the principles of X-ray diffraction and its applications to materials characterization. It consists of three parts. The first deals with elementary crystallography and optics, which is essential for understanding the theory of X-ray diffraction discussed in the second section of the book. Part 2 describes how the X-ray diffraction can be applied for characterizing such various forms of materials as thin films, single crystals, and powders. The third section of the book covers applications of X-ray diffraction. The book presents a number of examples to help readers better comprehend the subject. X-Ray Diffraction for Materials Research: From Fundamentals to Applications also • provides background knowledge of diffraction to enable nonspecialists to become familiar with the topics • covers the practical applications as well as the underlying principle of X-ray diffraction • presents appropriate examples with answers to help readers understand the contents more easily • includes thin film characterization by X-ray diffraction with relevant experimental techniques • presents a huge number of elaborately drawn graphics to help illustrate the content The book will help readers (students and researchers in materials science, physics, and chemistry) understand crystallography and crystal structures, interference and diffraction, structural analysis of bulk materials, characterization of thin films, and nondestructive measurement of internal stress and phase transition. Diffraction is an optical phenomenon and thus can be better understood when it is explained with an optical approach, which has been neglected in other books. This book helps to fill that gap, providing information to convey the concept of X-ray diffraction and how it can be applied to the materials analysis. This book will be a valuable reference book for researchers in the field and will work well as a good introductory book of X-ray diffraction for students in materials science, physics, and chemistry.
By illustrating a wide range of specific applications in all major industries, this work broadens the coverage of X-ray diffraction beyond basic tenets, research and academic principles. The book serves as a guide to solving problems faced everyday in the laboratory, and offers a review of the current theory and practice of X-ray diffraction, major
Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. - Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field - Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation - Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike
This book provides a comprehensive overview of thin film structures in energy applications. Each chapter contains both fundamentals principles for each thin film structure as well as the relevant energy application technologies. The authors cover thin films for a variety of energy sectors including inorganic and organic solar cells, DSSCs, solid oxide fuel cells, thermoelectrics, phosphors and cutting tools.
This comprehensive text describes the fundamentals of X-ray multiple-wave interaction in crystals and its applications in condensed matter physics and crystallography. It covers current theoretical approaches and application methods for many materials, including macromolecular crystals, thin films, semiconductors, quasicrystals and nonlinear optical materials. X-ray optics is also addressed. Designed primarily as a reference for researchers in condensed matter, crystallography, materials science, and synchrotron-related topics, the book will also be useful as a textbook for graduate and senior-year undergraduate courses on special topics in X-ray diffraction.
An indispensable resource for researchers and students in materials science, chemistry, physics, and pharmaceuticals Written by one of the pioneers of 2D X-Ray Diffraction, this updated and expanded edition of the definitive text in the field provides comprehensive coverage of the fundamentals of that analytical method, as well as state-of-the art experimental methods and applications. Geometry convention, x-ray source and optics, two-dimensional detectors, diffraction data interpretation, and configurations for various applications, such as phase identification, texture, stress, microstructure analysis, crystallinity, thin film analysis, and combinatorial screening are all covered in detail. Numerous experimental examples in materials research, manufacture, and pharmaceuticals are provided throughout. Two-dimensional x-ray diffraction is the ideal, non-destructive analytical method for examining samples of all kinds including metals, polymers, ceramics, semiconductors, thin films, coatings, paints, biomaterials, composites, and more. Two-Dimensional X-Ray Diffraction, Second Edition is an up-to-date resource for understanding how the latest 2D detectors are integrated into diffractometers, how to get the best data using the 2D detector for diffraction, and how to interpret this data. All those desirous of setting up a 2D diffraction in their own laboratories will find the author’s coverage of the physical principles, projection geometry, and mathematical derivations extremely helpful. Features new contents in all chapters with most figures in full color to reveal more details in illustrations and diffraction patterns Covers the recent advances in detector technology and 2D data collection strategies that have led to dramatic increases in the use of two-dimensional detectors for x-ray diffraction Provides in-depth coverage of new innovations in x-ray sources, optics, system configurations, applications and data evaluation algorithms Contains new methods and experimental examples in stress, texture, crystal size, crystal orientation and thin film analysis Two-Dimensional X-Ray Diffraction, Second Edition is an important working resource for industrial and academic researchers and developers in materials science, chemistry, physics, pharmaceuticals, and all those who use x-ray diffraction as a characterization method. Users of all levels, instrument technicians and X-ray laboratory managers, as well as instrument developers, will want to have it on hand.
This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.
Authored by a university professor deeply involved in X-ray diffraction-related research, this textbook is based on his lectures given to graduate students for more than 20 years. It adopts a well-balanced approach, describing basic concepts and experimental techniques, which make X-ray diffraction an unsurpassed method for studying the structure of materials. Both dynamical and kinematic X-ray diffraction is considered from a unified viewpoint, in which the dynamical diffraction in single-scattering approximation serves as a bridge between these two parts. The text emphasizes the fundamental laws that govern the interaction of X-rays with matter, but also covers in detail classical and modern applications, e.g., line broadening, texture and strain/stress analyses, X-ray mapping in reciprocal space, high-resolution X-ray diffraction in the spatial and wave vector domains, X-ray focusing, inelastic and time-resolved X-ray scattering. This unique scope, in combination with otherwise hard-to-find information on analytic expressions for simulating X-ray diffraction profiles in thin-film heterostructures, X-ray interaction with phonons, coherent scattering of Mossbauer radiation, and energy-variable X-ray diffraction, makes the book indispensable for any serious user of X-ray diffraction techniques. Compact and self-contained, this textbook is suitable for students taking X-ray diffraction courses towards specialization in materials science, physics, chemistry, or biology. Numerous clear-cut illustrations, an easy-to-read style of writing, as well as rather short, easily digestible chapters all facilitate comprehension.
This accessible text is now fully revised and updated, providing an overview of fabrication technologies and materials needed to realize modern microdevices. It demonstrates how common microfabrication principles can be applied in different applications, to create devices ranging from nanometer probe tips to meter scale solar cells, and a host of microelectronic, mechanical, optical and fluidic devices in between. Latest developments in wafer engineering, patterning, thin films, surface preparation and bonding are covered. This second edition includes: expanded sections on MEMS and microfluidics related fabrication issues new chapters on polymer and glass microprocessing, as well as serial processing techniques 200 completely new and 200 modified figures more coverage of imprinting techniques, process integration and economics of microfabrication 300 homework exercises including conceptual thinking assignments, order of magnitude estimates, standard calculations, and device design and process analysis problems solutions to homework problems on the complementary website, as well as PDF slides of the figures and tables within the book With clear sections separating basic principles from more advanced material, this is a valuable textbook for senior undergraduate and beginning graduate students wanting to understand the fundamentals of microfabrication. The book also serves as a handy desk reference for practicing electrical engineers, materials scientists, chemists and physicists alike. www.wiley.com/go/Franssila_Micro2e