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This timely book combines theory, applications, and projections on ultrafast diode lasers (UDL). A comprehensive treatment of UDLs from basic physical principles to applications in optical fiber communications and ultrafast electronics.
Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications for metals, dielectrics, and biological tissue; advanced electronics and semiconductor processing; optical coherence tomography; multiphoton microscopy; optical sampling and scanning; THz generation and imaging; optical communication systems; absolute phase control of optical signals; and more.
Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications
This book is composed of seven invited papers which present the current status of high speed diode lasers. Fast carrier and photon dynamics in directly modulated MQW lasers is analyzed and novel design approaches are considered which were critical for the demonstration and record of 40 GHz modulation bandwidth. Attention is centered on the challenges in creation of high speed and low chirp single mode DFB lasers. Recent progress in mode-locked diode lasers is covered, specifically by the examples of 160 fs pulse generation and appearance of microwave pulse repetition rates. Future trends in increasing of high speed laser performance are also examined.
This textbook presents a comprehensive introduction to ultrafast laser physics with a keen awareness of the needs of graduate students. It is self-contained and ready to use for both ultrafast laser courses and background for experimental investigation in the lab. The book starts with an advanced introduction to linear and nonlinear pulse propagation, details Q-switching and modelocking and goes into detail while explaining ultrashort pulse generation and measurement. Finally, the characterization of the laser signals is illustrated, and a broad range of applications presented. A multitude of worked examples and problems with solutions help to deepen the reader's understanding.
In this monograph, the authors address the physics and engineering together with the latest achievements of efficient and compact ultrafast lasers based on novel quantum-dot structures and devices. Their approach encompasses a broad range of laser systems, while taking into consideration not only the physical and experimental aspects but also the much needed modeling tools, thus providing a holistic understanding of this hot topic.
Ultrafast photonics has become an interdisciplinary topic of high international research interest because of the spectacular development of compact and efficient lasers producing optical pulses with durations in the femtosecond time domain. Present day long-haul telecommunications systems are almost entirely based on the transmission of short burst
Ultrafast photonics has become an interdisciplinary topic of high international research interest because of the spectacular development of compact and efficient lasers producing optical pulses with durations in the femtosecond time domain. Present day long-haul telecommunications systems are almost entirely based on the transmission of short burst
This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices.
The laser has revolutionized many areas of science and society, providing bright and versatile light sources that transform the ways we investigate science and enables trillions of dollars of commerce. Now a second laser revolution is underway with pulsed petawatt-class lasers (1 petawatt: 1 million billion watts) that deliver nearly 100 times the total world's power concentrated into a pulse that lasts less than one-trillionth of a second. Such light sources create unique, extreme laboratory conditions that can accelerate and collide intense beams of elementary particles, drive nuclear reactions, heat matter to conditions found in stars, or even create matter out of the empty vacuum. These powerful lasers came largely from U.S. engineering, and the science and technology opportunities they enable were discussed in several previous National Academies' reports. Based on these advances, the principal research funding agencies in Europe and Asia began in the last decade to invest heavily in new facilities that will employ these high-intensity lasers for fundamental and applied science. No similar programs exist in the United States. Opportunities in Intense Ultrafast Lasers assesses the opportunities and recommends a path forward for possible U.S. investments in this area of science.