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The present monograph represents itself as a tutorial to the ?eld of optical properties of thin solid ?lms. It is neither a handbook for the thin ?lm prac- tioner,noranintroductiontointerferencecoatingsdesign,norareviewonthe latest developments in the ?eld. Instead, it is a textbook which shall bridge the gap between ground level knowledge on optics, electrodynamics, qu- tummechanics,andsolidstatephysicsononehand,andthemorespecialized level of knowledge presumed in typical thin ?lm optical research papers on the other hand. In writing this preface, I feel it makes sense to comment on three points, which all seem to me equally important. They arise from the following (- tually interconnected) three questions: 1. Who can bene?t from reading this book? 2. What is the origin of the particular material selection in this book? 3. Who encouraged and supported me in writing this book? Let me start with the ?rst question, the intended readership of this book. It should be of use for anybody, who is involved into the analysis of - tical spectra of a thin ?lm sample, no matter whether the sample has been prepared for optical or other applications. Thin ?lm spectroscopy may be r- evant in semiconductor physics, solar cell development, physical chemistry, optoelectronics, and optical coatings development, to give just a few ex- ples. The book supplies the reader with the necessary theoretical apparatus for understanding and modelling the features of the recorded transmission and re?ection spectra.
The book bridges the gap between fundamental physics courses (such as optics, electrodynamics, quantum mechanics and solid state physics) and highly specialized literature on the spectroscopy, design, and application of optical thin film coatings. Basic knowledge from the above-mentioned courses is therefore presumed. Starting from fundamental physics, the book enables the reader derive the theory of optical coatings and to apply it to practically important spectroscopic problems. Both classical and semiclassical approaches are included. Examples describe the full range of classical optical coatings in various spectral regions as well as highly specialized new topics such as rugate filters and resonant grating waveguide structures. The second edition has been updated and extended with respect to probing matter in different spectral regions, homogenous and inhomogeneous line broadening mechanisms and the Fresnel formula for the effect of planar interfaces.
The present monograph represents itself as a tutorial to the ?eld of optical properties of thin solid ?lms. It is neither a handbook for the thin ?lm prac- tioner,noranintroductiontointerferencecoatingsdesign,norareviewonthe latest developments in the ?eld. Instead, it is a textbook which shall bridge the gap between ground level knowledge on optics, electrodynamics, qu- tummechanics,andsolidstatephysicsononehand,andthemorespecialized level of knowledge presumed in typical thin ?lm optical research papers on the other hand. In writing this preface, I feel it makes sense to comment on three points, which all seem to me equally important. They arise from the following (- tually interconnected) three questions: 1. Who can bene?t from reading this book? 2. What is the origin of the particular material selection in this book? 3. Who encouraged and supported me in writing this book? Let me start with the ?rst question, the intended readership of this book. It should be of use for anybody, who is involved into the analysis of - tical spectra of a thin ?lm sample, no matter whether the sample has been prepared for optical or other applications. Thin ?lm spectroscopy may be r- evant in semiconductor physics, solar cell development, physical chemistry, optoelectronics, and optical coatings development, to give just a few ex- ples. The book supplies the reader with the necessary theoretical apparatus for understanding and modelling the features of the recorded transmission and re?ection spectra.
This book is an up-to-date survey of the major optical characterization techniques for thin solid films. Emphasis is placed on practicability of the various approaches. Relevant fundamentals are briefly reviewed before demonstrating the application of these techniques to practically relevant research and development topics. The book is written by international top experts, all of whom are involved in industrial research and development projects.
University Physics is a three-volume collection that meets the scope and sequence requirements for two- and three-semester calculus-based physics courses. Volume 1 covers mechanics, sound, oscillations, and waves. Volume 2 covers thermodynamics, electricity and magnetism, and Volume 3 covers optics and modern physics. This textbook emphasizes connections between between theory and application, making physics concepts interesting and accessible to students while maintaining the mathematical rigor inherent in the subject. Frequent, strong examples focus on how to approach a problem, how to work with the equations, and how to check and generalize the result. The text and images in this textbook are grayscale.
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.
This book emphasises both experimental and theoretical aspects of surface, interface and thin film physics. Compa- red to the earlier editions, which bore the title "Surfaces and Interfaces of Solid Materials", the book now places more emphasis on thin films, including also their superconducting and ferromagnetic properties. The present 4th edition thus presents techniques of preparing well-defined solid surfaces and interfaces, fundamental aspects of adsorption and layer growth, as well as basic models for the descripti- on of structural, vibronic and electronic properties of sur- faces, interfaces and thin films. Because of their importan- ce for modern information technology, significant attention is paid to the electronic properties of semiconductor inter- faces and heterostructures. Collective phenomena , such as superconductivity and ferromagnetism, also feature promi- nently. Experimental sections covering essential measurement and preparation techniques are presented in separate panels.
This book focuses on advanced optical spectroscopy techniques for the characterization of cutting-edge semiconductor materials. It covers a wide range of techniques such as Raman, infrared, photoluminescence, and cathodoluminescence (CL) spectroscopy, including an introduction to their physical fundamentals and best operating principles. Aimed at professionals working in the research and development of semiconductors and semiconductor materials, this book looks at a broad class of materials such as silicon and silicon dioxide, nano-diamond thin films, quantum dots, and gallium oxide. In addition to the spectroscopic techniques covered, this book features a chapter devoted to the use of a scanning electron transmission microscope as an excitation source for CL spectroscopy. Written by a practicing industry expert in the field, this book is an ideal source of reference and best-practices guide for physicists, as well as materials scientists and engineers involved in the area of spectroscopy of semiconductor materials. Further, this book introduces the cutting-edge spectroscopy such as optical photothermal IR and Raman spectroscopy or terahertz time-domain spectroscopy (THz-TDS) etc.