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Market: Those involved in the design and use of UHV component systems. Written 25 years ago, this book explains both the design and use of UHV systems and components, as well as the underlying physical principles on which the performance of the equipment depends. Because of its close association of these underlying physical principles with the practical problems inherent in UHV equipment, the book retains its value to this day.
Ultrahigh Vacuum Practice covers topics about components suitable for ultrahigh vacuum applications, their theory of operation, their assembly and use, and their performance and calibration. The book starts by discussing the fundamentals of vacuum science and technology. The text then describes the physical properties and methods of preparing the materials for ultrahigh vacuum and the various pumps and their performance and application to ultrahigh vacuum systems. The mechanism and performance of the various ultrahigh vacuum gauges and the problem of gauge calibration at low pressures, as well as the accuracy that can be expected are discussed as well. Partial pressure measurements, ultrahigh vacuum components, and liquid nitrogen replenisher are also considered. The book tackles the system requirements and applications, as well as methods for detecting leak. Users or potential users of ultrahigh vacuum equipment and expert vacuum engineers will find the book useful.
In the decade and a half since the publication of the Second Edition of A User?s Guide to Vacuum Technology there have been many important advances in the field, including spinning rotor gauges, dry mechanical pumps, magnetically levitated turbo pumps, and ultraclean system designs. These, along with improved cleaning and assembly techniques have made contamination-free manufacturing a reality. Designed to bridge the gap in both knowledge and training between designers and end users of vacuum equipment, the Third Edition offers a practical perspective on today?s vacuum technology. With a focus on the operation, understanding, and selection of equipment for industrial processes used in semiconductor, optics, packaging, and related coating technologies, A User?s Guide to Vacuum Technology, Third Edition provides a detailed treatment of this important field. While emphasizing the fundamentals and touching on significant topics not adequately covered elsewhere, the text avoids topics not relevant to the typical user.
This comprehensive, standard work has been updated to remain an important resource for all those needing detailed knowledge of the theory and applications of vacuum technology. The text covers the existing knowledge on all aspects of vacuum science and technology, ranging from fundamentals to components and operating systems. It features many numerical examples and illustrations to help visualize the theoretical issues, while the chapters are carefully cross-linked and coherent symbols and notations are used throughout the book. The whole is rounded off by a user-friendly appendix of conversion tables, mathematical tools, material related data, overviews of processes and techniques, equipment-related data, national and international standards, guidelines, and much more. As a result, engineers, technicians, and scientists will be able to develop and work successfully with the equipment and environment found in a vacuum.
Revised and expanded second edition of the standard work on new techniques for studying solid surfaces.
This work represents a sound introduction to the fundamental principles of infrared microspectroscopy (IMS). It describes how IMS is used to solve specific microanalytical problems in a variety of disciplines, including forensic analysis, art conservation, and geological, pharmaceutical and electronics research. The book discusses when and how to use special techniques such as line scanning, 3-dimensional imaging and attenuated total reflection and grazing-angle spectroscopy.
Vacuum technology is widely used in many manufacturing and developmental processes and its applications grow in scope and sophistication. It is an inter-disciplinary subject, embracing aspects of mechanical, electrical and chemical engineering, chemistry, and materials science while having a broad foundation in physics. In spite of its technological importance, and perhaps because of its cross-disciplinary nature, substantial teaching and training is not widely available. Basic Vacuum Technology aims to give readers a firm foundation of fundamental knowledge about the subject and the ability to apply it. This book is an introductory text on how to use vacuum techniques. It provides a good grounding in the basic scientific principles and concepts that underlie the production and measurement of vacua. The authors describe how these are applied in representative low, medium, high, and ultra-high vacuum systems and explain the most important practical aspects of the operation of a large variety of pumps, components, and measuring instrumentation. The book introduces numerical methods for analysis and prediction of the behavior of vacuum systems in terms of the properties of their individual elements and enables readers to recognize and resolve problems with malfunctioning systems.
Vacuum apparatus is widely used in research and industrial establishments for providing and monitoring the working environments required for the operation of many kinds of scientific instruments and process plant. The vacuum conditions needed range from the relatively coarse vacuum requirements in applications covering diverse fields such as food packaging, dentistry (investment casting), vacuum forming, vacuum metallur gical processes, vacuum impregnation, molecular distillation, vacuum drying and freeze drying etc. to the other extreme involving the highest possible vacuum as in particle accelerators, space technology -both in simulation and outer space, and research studies of atomically clean surfaces and pure condensed metal films. Vacua commence with the rough vacuum region, i.e. from atmosphere to 100 Pa * passing 6 through medium vacuum of 100 Pa to 0·1 Pa and high vacuum of 0·1 Pa to 1 J.lPa (10- Pa) until ultra high vacuum is reached below 1 J.lPa to the limit of measurable pressure about 12 I pPa (10- Pa).