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Although supercritial fluid (SCF) technology is now widely used in extraction and purification processes (in the petrochemical, food and pharmaceuticals industries), this book is the first to address the new application of cleaning. The objective is to provide a roadmap for readers who want to know whether SCF technology can meet their own processing and cleaning needs. It is particularly helpful to those striving to balance the requirements for a clean product and a clean environment. The interdisciplinary subject matter will appeal to scientists and engineers in all specialties ranging from materials and polymer sciences to chemistry and physics. It is also useful to those developing new processes for other applications, and references given at the end of each chapter provide links to the wider body of SCF literature. The book is organized with topics progressing from the fundamental nature of the supercritical state, through process conditions and materials interactions, to economic considerations. Practical examples are included to show how the technology has been successfully applied. The first four chapters consider principles governing SCF processing, detailing issues such as solubility, design for cleanability, and the dynamics of particle removal. The next three chapters discuss surfactants and microemulsions, SCF interaction with polymers, and the use of supercritical carbon dioxide (CO2) as a cleaning solvent. The closing chapters focus on more practical considerations such as scaleup, equipment costs, and financial analysis.
With all the cleaning approaches available, how do you choose which one is best for your needs? Components manufacturers wonder which will provide a competitive edge. Chemists and engineers worry about the effect of any process modification on a critical component or on the stability of an irreplaceable antique. There is no silver bullet, n
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination. This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale. - Comprehensive coverage of innovations in surface contamination and cleaning - Written by established experts in the contamination and cleaning field - Each chapter is a comprehensive review of the state of the art - Case studies included
Supercritical fluids are neither gas nor liquid, but can be compressed gradually from low to high density and they are therefore interesting and important as tunable solvents and reaction media in the chemical process industry. By adjusting the density the properties of these fluids can be customised and manipulated for a given process - physical or chemical transformation. Separation and processing using supercritical solvents such as CO2 are currently on-line commercially in the food, essential oils and polymer industries. Many agencies and industries are considering the use of supercritical water for waste remediation. Supercritical fluid chromatography represents another, major analytical application. Significant advances have recently been made in materials processing, ranging from particle formation to the creation of porous materials. The chapters in this book provide tutorial accounts of topical areas centred around: (1) phase equilibria, thermodynamics and equations of state; (2) critical behaviour, crossover effects; (3) transport and interfacial properties; (4) molecular modelling, computer simulation; (5) reactions, spectroscopy; (6) phase separation kinetics; (7) extractions; (8) applications to polymers, pharmaceuticals, natural materials and chromatography; (9) process scale-up.
This set consists of two volumes: Cleaning Agents and Systems and Applications, Processes, and Controls. Updated, expanded, re-organized, and rewritten, this two-volume handbook covers cleaning processes, applications, management, safety, and environmental concerns. The editors rigorously examine technical issues, cleaning agent options and systems, chemical and equipment integration, and contamination control, as well as cleanliness standards, analytical testing, process selection, implementation and maintenance, specific application areas, and regulatory issues. A collection of international contributors gives the text a global viewpoint. Color illustrations, video clips, and animation are available online to help readers better understand presented material.
Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. - Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field - Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries - Serves as a guide to the selection of precision cleaning techniques for specific applications
Must-have reference for processes involving liquids, gases, and mixtures Reap the time-saving, mistake-avoiding benefits enjoyed by thousands of chemical and process design engineers, research scientists, and educators. Properties of Gases and Liquids, Fifth Edition, is an all-inclusive, critical survey of the most reliable estimating methods in use today --now completely rewritten and reorganized by Bruce Poling, John Prausnitz, and John O’Connell to reflect every late-breaking development. You get on-the-spot information for estimating both physical and thermodynamic properties in the absence of experimental data with this property data bank of 600+ compound constants. Bridge the gap between theory and practice with this trusted, irreplaceable, and expert-authored expert guide -- the only book that includes a critical analysis of existing methods as well as hands-on practical recommendations. Areas covered include pure component constants; thermodynamic properties of ideal gases, pure components and mixtures; pressure-volume-temperature relationships; vapor pressures and enthalpies of vaporization of pure fluids; fluid phase equilibria in multicomponent systems; viscosity; thermal conductivity;diffusion coefficients; and surface tension.
Recent advances in analytical chemistry have turned it into a virtually unrecognizable science compared to a few decades ago, when it lagged behind other sciences and techniques. However, advances in analytical science have been far from universal: while innovations in instrumentation and data acquisition and processing systems have reached unprecedented levels thanks to parallel breakthroughs in computer science and chemo metrics, progress in preliminary operations has been much slower despite their importance to analytical results. Thus, such clear trends in analytical process development as automation and miniaturization have not reached preliminary operations to the same extent, even though this area is pro bably in the greatest need. Improvement in preliminary operations is thus an urgent goal of analytical chemistry on the verge of the twenty first century. Increased R&D endeavours and manufacture of commercially available automatic equipment for implementation of the wide variety of operations that separate the uncollected, unmeasured, untreated sample from the signal measuring step are thus crucial on account of the wide variability of such operations, which precludes development of all-purpose equipment, and the complexity of some, particularly relating to solid samples. Supercritical fluid extraction opens up interesting prospects in this context and is no doubt an effective approach to automatioI1 and mini aturization in the preliminary steps of the analytical process. The dramatic developments achieved in its short life are atypical in many respects.
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.