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In the past few decades, the semiconductor industry kept shrinking the feature size of CMOS transistors with great efforts in order to pack more functional devices onto a smaller footprint, which follows the famous Moore's law. However, it becomes extremely difficult to ensure the correct functionalities of fabricated circuits in today's integrated circuit (IC) technology, because the increasing variations from the manufacturing have introduced inevitable and significant uncertainties in circuit performance. Moreover, the requirements of lower power consumption and higher operating frequency for today's mobile devices demand tighter performance constraints on fabricated circuits. Therefore, reliable and efficient statistical analysis methodologies are highly sought to enable IC designers to predict the stochastic behavior in fabricated circuits under random process variations before entering expensive manufacturing. In this research, the impacts of process variations are studied in the contexts of failure analysis of memory circuits, stochastic behavioral modeling and variational capacitance extraction and novel solutions to these contexts are presented. In particular, memory circuits require an extremely small failure probability for one single cell due to their high replication count on a small footprint, thereby making it a great challenging task to provide accurate estimations. To this end, an improved importance sampling algorithm is proposed to significantly expedite the convergence rate of failure probability estimation for memory circuits without compromising accuracy. For high dimensional problems, the conventional importance sampling schemes tend to lose accuracy and become very unreliable. To fix this issue, a novel and fast statistical analysis is presented to estimate the extremely small failure probability of memory circuits in high dimensions. In addition, an efficient statistical analysis is proposed to explore the stochastic behavior of circuit designs due to random process variations. This methodology enables IC designers to accurately predict the "arbitrary" probabilistic distribution of circuit performance considering the uncertainties from the manufacturing. Lastly, parasitic capacitance has more impact on circuit performance in today's sub-micron CMOS technology, which leads to unpredictable delay variations and severe timing errors. To address this issue, a novel and fast capacitance extraction algorithm is proposed to model the geometric variations of interconnect circuits and accurately calculate the variational parasitic capacitance. These stochastic modeling and analysis methodologies can be used to analyze custom circuits under process variations in the present nano-technology era and future generations of IC technology.
An Advanced Study Institute on process and device modeling for integrated circuit design was held in Louvain-la-Neuve. Belgium on July 19-29. 1977 under the auspices of the Scientific Affairs Division of NATO. The Institute was organized by a scientific organizing committee consisting of Professor F. Van de Wiele of the Universite Catholique de Louvain. Professor W. L. Engl of the Technische Hochschule Aachen and Professor P. Jespers of the Universite Catholique de Louvain. This book represents the contributions of the lecturers at the Institute and the chapters present a concise treatment of a very timely subject. namely. process and device modeling for integrated circuit design. The organization of the book parallels the program at the Institute with an introd0ction ·comprised of a review of mo deling and basic semiconductor physics. This is followed by the chapters devoted to basic technologies. modeling of bipolar and MoS devices. The last chapter of the book presents the specific topic of process modeling. The subject matter of this book is suitable for a wide range of interests from the advanced student. through the practisihg physicist and engineer. to the research worker. Although a novice may find some difficulty with the mathematical development. he can acquire a perspective into the field of process and device modeling for integrated circuit design with this bDOk. Likewise. portions of this book may be used as a textbook since the chap ters are intructional and self-contained.
Traditionally, Computer Aided Design (CAD) tools have been used to create the nominal design of an integrated circuit (IC), such that the circuit nominal response meets the desired performance specifications. In reality, however, due to the disturbances ofthe IC manufacturing process, the actual performancesof the mass produced chips are different than those for the nominal design. Even if the manufacturing process were tightly controlled, so that there were little variations across the chips manufactured, the environmentalchanges (e. g. those oftemperature, supply voltages, etc. ) would alsomakethe circuit performances vary during the circuit life span. Process-related performance variations may lead to low manufacturing yield, and unacceptable product quality. For these reasons, statistical circuit design techniques are required to design the circuit parameters, taking the statistical process variations into account. This book deals with some theoretical and practical aspects of IC statistical design, and emphasizes how they differ from those for discrete circuits. It de scribes a spectrum of different statistical design problems, such as parametric yield optimization, generalized on-target design, variability minimization, per formance tunning, and worst-case design. The main emphasis of the presen tation is placed on the principles and practical solutions for performance vari ability minimization. It is hoped that the book may serve as an introductory reference material for various groups of IC designers, and the methodologies described will help them enhance the circuit quality and manufacturability. The book containsseven chapters.
This book contains the papers presented at the 13th International Workshop on Field Programmable Logic and Applications (FPL) held on September 1–3, 2003. The conference was hosted by the Institute for Systems and Computer Engineering-Research and Development of Lisbon (INESC-ID) and the Depa- ment of Electrical and Computer Engineering of the IST-Technical University of Lisbon, Portugal. The FPL series of conferences was founded in 1991 at Oxford University (UK), and has been held annually since: in Oxford (3 times), Vienna, Prague, Darmstadt,London,Tallinn,Glasgow,Villach,BelfastandMontpellier.Itbrings together academic researchers, industrial experts, users and newcomers in an - formal,welcomingatmospherethatencouragesproductiveexchangeofideasand knowledge between delegates. Exciting advances in ?eld programmable logic show no sign of slowing down. New grounds have been broken in architectures, design techniques, run-time - con?guration, and applications of ?eld programmable devices in several di?erent areas. Many of these innovations are reported in this volume. The size of FPL conferences has grown signi?cantly over the years. FPL in 2002 saw 214 papers submitted, representing an increase of 83% when compared to the year before. The interest and support for FPL in the programmable logic community continued this year with 216 papers submitted. The technical p- gram was assembled from 90 selected regular papers and 56 posters, resulting in this volume of proceedings. The program also included three invited plenary keynote presentations from LSI Logic, Xilinx and Cadence, and three industrial tutorials from Altera, Mentor Graphics and Dafca.
This book targets custom IC designers who are encountering variation issues in their designs, especially for modern process nodes at 45nm and below, such as statistical process variations, environmental variations, and layout effects. It teaches them the state-of-the-art in Variation-Aware Design tools, which help the designer to analyze quickly the variation effects, identify the problems, and fix the problems. Furthermore, this book describes the algorithms and algorithm behavior/performance/limitations, which is of use to designers considering these tools, designers using these tools, CAD researchers, and CAD managers.
"The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought lithographic challenges to semiconductor modeling. These include stress optimization, transisto"
Low-power and low-energy VLSI has become an important issue in today's consumer electronics.This book is a collection of pioneering applied research papers in low power VLSI design and technology.A comprehensive introductory chapter presents the current status of the industry and academic research in the area of low power VLSI design and technology.Other topics cover logic synthesis, floorplanning, circuit design and analysis, from the perspective of low power requirements.The readers will have a sampling of some key problems in this area as the low power solutions span the entire spectrum of the design process. The book also provides excellent references on up-to-date research and development issues with practical solution techniques.