Michel Bader
Published: 1961
Total Pages: 20
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Low-energy sputtering studies were conducted with the help of a specially designed ion accelerator. A high-intensity rf ion source was developed for use in conjunction with electrostatic acceleration and magnetic mass separation of ion beams in the 0 to 8 kev energy range. Beams of N+ or N2+ ions have been produced with intensities of 200 to 500 μa (̃1 cm2 in cross section) and energy half-widths of about 20 ev. The sputtering yields of five metals (Cu, Ni, Fe, Mo, and W) were obtained as a function of energy (0-8 kev), bombarding ion (N+ and N2+), and angle of incidence (normal and 45°). Results are presented and some of their theoretical implications are discussed.