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This book provides a long-needed survey of new results. Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems. The book offers a critical review of computational methods for calculating sputtering yields and also includes molecular dynamics calculations.
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
With contributions by numerous experts
In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.
With contributions by numerous experts
Comprehensive guide to an important materials science technique for students and researchers.
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
On attending a conference on the Jovian satellites at UCLA, I heard Lou Lanze rotti vigorously present the exciting data on the sputtering of water ice by Me V protons taken with W. L. Brown at AT&T Bell Labs. In his inimitable way he made clear that this new electronic sputtering process was very poorly under stood and was very important for surface properties of sattelites. I was immedia tely hooked, and have been working ever since with Lanzerotti, Brown, my col league at Virginia, John Boring, and Bo Sundqvist at Uppsala on understanding the ejection of material from surfaces and applying laboratory results to intere sting planetary problems. In the course of writing this book I also had the benefit of spending a semester with the Planetary Geosciences group in Hawaii, thanks to Tom McCord, a period of time with Doug Nash at JPL, and a period ot time with the group at Catania. The book was started with the encouragement of Lou Lanzerotti. The writing has gone slowly as the field has been changing rapidly. Even now I feel it is incom plete, as the interesting Halley dust data have just recently been interpreted in detail, Voyager has recently visited Neptune, and the data on Pluto are rapidly improving. However, most of the principles for plasma ion alteration of surfaces and gases have been established allowing, I hope, a coherent and useful frame work for incorporating both new laboratory and planetary data.