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This book examines in detail how a semiconductor device is designed and fabricated to satisfy best the requirements of the target application. The author presents and explains both basic and state-of-art semiconductor industry standards used in large/small signal equivalent circuit models for semiconductor devices that electronics engineers routinely use in their design calculations. The presentation includes detailed, step-by-step information on how a semiconductor device is fabricated, and the very sophisticated supporting technologies used in the process flow. The author also explains how standard laboratory equipment can be used to extract useful performance metrics of a semiconductor device.
The increasing prevalence of nanotechnologies has led to the birth of “nanoelectromagnetics,” a novel applied science related to the interaction of electromagnetic radiation with quantum mechanical low-dimensional systems. This book provides an overview of the latest advances in nanoelectromagnetics, and presents contributions from an interdisciplinary community of scientists and technologists involved in this research topic. The aspects covered here range from the synthesis of nanostructures and nanocomposites to their characterization, and from the design of devices and systems to their fabrication. The book also focuses on the novel frontier of terahertz technology, which has been expanded by the impressive strides made in nanotechnology, and presents a comprehensive overview of the: - synthesis of various nanostructured materials; - study of their electrical and optical properties; - use of nano-sized elements and nanostructures as building blocks for devices; - design and fabrication of nanotechnology devices operating in the THz, IR and optical range. The book introduces the reader to materials like nanocomposites, graphene nanoplatelets, carbon nanotubes, metal nanotubes, and silicon nanostructures; to devices like photonic crystals, microcavities, antennas, and interconnects; and to applications like sensing and imaging, with a special emphasis on the THz frequency range.
This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.
The Handbook of Porous Silicon brings together the expertise of a large, international team of almost 100 academic researchers, engineers, and product developers from industry across electronics, medicine, nutrition and consumer care to summarize the field in its entirity with 150 chapters and 5000 references. The volume presents 5 parts which cover fabrication techniques, material properties, characterization techniques, processing and applications. Much attention was given in the the past to its luminescent properties, but increasingly it is the biodegradability, mechanical, thermal and sensing capabilities that are attracting attention. The volume is divided into focussed data reviews with, wherever possible, quantitative rather than qualitative descriptions of both properties and performance. The book is targeted at undergraduates, postgraduates, and experienced researchers.
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications.