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The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. - Provides a broad overview on modern coating and thin film deposition techniques, and their applications - Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films - Each chapter includes experimental results illustrating various models, mechanisms or theories
Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Proceedings of the title symposium, held at the 1994 MRS Fall Meeting in Boston, 28 November-2 December 1994. Selected papers that were presented in both oral and poster sessions are divided into six topical groups: ion beam processing; defects and diffusion; ion-beam modification of polymers; analysis and characterization; sputtering; and laser-assisted and induced processes. Annotation copyright by Book News, Inc., Portland, OR