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Linking of materials properties with microstructures is a fundamental theme in materials science, for which a detailed knowledge of the modern characterization techniques is essential. Since modern materials such as high-temperature alloys, engineering thermoplastics and multilayer semiconductor films have many elemental constituents distributed in more than one phase, characterization is essential to the systematic development of such new materials and understanding how they behave in practical applications. X-ray techniques play a major role in providing information on the elemental composition and crystal and grain structures of all types of materials. The challenge to the materials characterization expert is to understand how specific instruments and analytical techniques can provide detailed information about what makes each material unique. The challenge to the materials scientist, chemist, or engineer is to know what information is needed to fully characterize each material and how to use this information to explain its behavior, develop new and improved properties, reduce costs, or ensure compliance with regulatory requirements. This comprehensive handbook presents all the necessary background to understand the applications of X-ray analysis to materials characterization with particular attention to the modern approach to these methods.
Volume is indexed by Thomson Reuters CPCI-S (WoS) X-ray applications and techniques are gaining importance and are moving to the forefront of science. A powerful tool with many advantages, X-ray applications and techniques present a route for rapid, hassle-free, non-destructive, safe and accurate analysis. This book contains a compilation of papers, all related to X-ray techniques, which are applied in various areas of science and technology, namely in research and industry. This publication aims to showcase the current diversity and versatility of X-ray related techniques. With contributors from all around the world, this publication of compiled papers will relate a host of X-ray related techniques with aims and the eventual findings, all of which are presented in a short and concise manner. It is believed that this book will be a good scientific literature which provides clear and important information on X-ray related ventures.
X-ray line profile analysis is an effective and non-destructive method for the characterization of the microstructure in crystalline materials. Supporting research in the area of x-ray line profile analysis is necessary in promoting further developments in this field. X-Ray Line Profile Analysis in Materials Science aims to synthesize the existing knowledge of the theory, methodology, and applications of x-ray line profile analysis in real-world settings. This publication presents both the theoretical background and practical implementation of x-ray line profile analysis and serves as a reference source for engineers in various disciplines as well as scholars and upper-level students.
X-ray diffraction is a useful and powerful analysis technique for characterizing crystalline materials commonly employed in MSE, physics, and chemistry. This informative new book describes the principles of X-ray diffraction and its applications to materials characterization. It consists of three parts. The first deals with elementary crystallography and optics, which is essential for understanding the theory of X-ray diffraction discussed in the second section of the book. Part 2 describes how the X-ray diffraction can be applied for characterizing such various forms of materials as thin films, single crystals, and powders. The third section of the book covers applications of X-ray diffraction. The book presents a number of examples to help readers better comprehend the subject. X-Ray Diffraction for Materials Research: From Fundamentals to Applications also • provides background knowledge of diffraction to enable nonspecialists to become familiar with the topics • covers the practical applications as well as the underlying principle of X-ray diffraction • presents appropriate examples with answers to help readers understand the contents more easily • includes thin film characterization by X-ray diffraction with relevant experimental techniques • presents a huge number of elaborately drawn graphics to help illustrate the content The book will help readers (students and researchers in materials science, physics, and chemistry) understand crystallography and crystal structures, interference and diffraction, structural analysis of bulk materials, characterization of thin films, and nondestructive measurement of internal stress and phase transition. Diffraction is an optical phenomenon and thus can be better understood when it is explained with an optical approach, which has been neglected in other books. This book helps to fill that gap, providing information to convey the concept of X-ray diffraction and how it can be applied to the materials analysis. This book will be a valuable reference book for researchers in the field and will work well as a good introductory book of X-ray diffraction for students in materials science, physics, and chemistry.
The papers presented in this volume of Advances in X-Ray Analysis were chosen from those presented at the Fourteenth Annual Conference on the Applications of X-Ray Analysis. This conference, sponsored by the Metallurgy Division of the Denver Research Institute, University of Denver, was held on August 24,25, and 26, 1965, at the Albany Hotel in Denver, Colorado. Of the 56 papers presented at the conference, 46 are included in this volume; also included is an open discussion held on the effects of chemical com bination on X-ray spectra. The subjects presented represent a broad scope of applications of X-rays to a variety of fields and disciplines. These included such fields as electron-probe microanalysis, the effect of chemical combination on X-ray spectra, and the uses of soft and ultrasoft X-rays in emission analysis. Also included were sessions on X-ray diffraction and fluor escence analysis. There were several papers on special topics, including X-ray topography and X-ray absorption fine-structure analysis. William L. Baun contributed considerable effort toward the conference by organizing the session on the effect of chemical combination on X-ray spectra fine structure. A special session was established through the excellent efforts of S. P. Ong on the uses and applica tions of soft X-rays in fluorescent analysis. We offer our sincere thanks to these men, for these two special sessions contributed greatly to the success of the conference.
This book will provide readers with a good overview of some of most recent advances in the field of High-Z materials. There will be a good mixture of general chapters in both technology and applications in opto-electronics, X-ray detection and emerging optoelectronics applications. The book will have an in-depth review of the research topics from world-leading specialists in the field.
The 41st Annual Conference on Applications of X-Ray Analysis was held August 3-7, 1992, at the Sheraton Colorado Springs Hotel, Colorado Springs, Colorado. The Conference is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for further developments. In recent years, one of the most exciting and important developments in the x-ray field has been the applications of grazing-incidence x-rays for surface and thin-film analysis. To introduce the conference attendees to these "leading-edge" developments, the topic for the Plenary Session was "Grazing-Incidence X Ray Characterization of Materials. " The Conference had the privilege of inviting leading experts in the field of x-ray thin film analysis to deliver lectures at the Plenary Session. Dr. D. K. Bowen, University of Warwick, U. K. , opened the session with a lecture on "Grazing Incidence X-Ray Scattering from Thin Films. " He reviewed and compared grazing incidence diffraction, fluorescence and reflectivity techniques. Results of experimental and theoretical analysis were also discussed. Dr. B. Lenge1er, Forchungszentrum Ju1ich, Germany, followed with a lecture on "Grazing Incidence Diffuse X-Ray Scattering from Thin Films. " He concentrated on the use of newly developed "off-specular" reflectivity techniques for the determination of vertical roughness, lateral correlation length and contour exponent on surfaces.
The proceedings of the combined First Pacific-International Congress on X-Ray Analytical Methods (PICXAM) and Fortieth Annual Conference on Applications of X-Ray Analysis, held in Hilo and Honolulu Hawaii, August 1991, comprise reports on the latest developments in international research on X-ray fl