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This thesis presents a theoretical and experimental approach for the rapid fabrication, optimization and testing of holographic sensors for the quantification of pH, organic solvents, metal cations, and glucose in solutions. Developing non-invasive and reusable diagnostics sensors that can be easily manufactured will support the monitoring of high-risk individuals in any clinical or point-of-care setting. Sensor fabrication approaches outlined include silver-halide chemistry, laser ablation and photopolymerization. The sensors employ off-axis Bragg diffraction gratings of ordered silver nanoparticles and localized refractive index changes in poly (2-hydroxyethyl methacrylate) and polyacrylamide films. The sensors exhibited reversible Bragg peak shifts, and diffracted the spectrum of narrow-band light over the wavelength range λpeak ≈ 495-1100 nm. Clinical trials of glucose sensors in the urine samples of diabetic patients demonstrated that they offer superior performance compared to commercial high-throughput urinalysis devices. Lastly, a generic smartphone application to quantify colorimetric tests was developed and tested for both Android and iOS operating systems. The sensing platform and smartphone application may have implications for the development of low-cost, reusable and equipment-free point-of-care diagnostic devices.
This volume collects the proceedings of the 23rd International Course of Crystallography, entitled "X-ray and Neutron Dynamical Diffraction, Theory and Applications," which took place in the fascinating setting of Erice in Sicily, Italy. It was run as a NATO Advanced Studies Institute with A. Authier (France) and S. Lagomarsino (Italy) as codirectors, and L. Riva di Sanseverino and P. Spadon (Italy) as local organizers, R. Colella (USA) and B. K. Tanner (UK) being the two other members of the organizing committee. It was attended by about one hundred participants from twenty four different countries. Two basic theories may be used to describe the diffraction of radiation by crystalline matter. The first one, the so-called geometrical, or kinematical theory, is approximate and is applicable to small, highly imperfect crystals. It is used for the determination of crystal structures and describes the diffraction of powders and polycrystalline materials. The other one, the so-called dynamical theory, is applicable to perfect or nearly perfect crystals. For that reason, dynamical diffraction of X-rays and neutrons constitutes the theoretical basis of a great variety of applications such as: • the techniques used for the characterization of nearly perfect high technology materials, semiconductors, piezoelectric, electrooptic, ferroelectric, magnetic crystals, • the X-ray optical devices used in all modem applications of Synchrotron Radiation (EXAFS, High Resolution X-ray Diffractometry, magnetic and nuclear resonant scattering, topography, etc. ), and • X-ray and neutron interferometry.
The application of solid-state detectors of high energy resolution to x-ray spectrometry, and the increasing use of compu ters in both measurement and data evaluation, are giving a new stimulus to x-ray techniques in analytical chemistry. The Twentieth Annual Denver X-ray Conference reflects this renewed interest in several ways. The invited papers, grouped in Session I, review the charac teristics of the detectors used in the measurement of x-rays. One paper is dedicated to the detection of single ions. Although such a subject may appear to be marginal to the purposes of the Denver Conference, we must recognize the affinity of techniques applied to similar purposes. Ion probe mass spectrometry is dedicated to tasks similar to those performed by x-ray spectrometry with the electron probe microanalyzer. Scientists and technologists will see these two techniques discussed in the same meetings. The discussion of automation and programming is not limited to the two invited speakers, but extends to papers presented in more than one session. The matter of fluorescence analysis by isotope- and tube-excitation will also be of great interest to those concerned with the practical applications of x-ray techniques. The communications contained in this volume, and the lively discussions which frequently followed the presentation of papers, attest to the vitality of the subjects which are the concern of the Annual Denver X-ray Conference.
The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems. Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text. Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.
This book focuses on a research field that is rapidly emerging as one of the most promising ones for the global optics and photonics community: the “lab-on-fiber” technology. Inspired by the well-established "lab on-a-chip" concept, this new technology essentially envisages novel and highly functionalized devices completely integrated into a single optical fiber for both communication and sensing applications. Based on the R&D experience of some of the world's leading authorities in the fields of optics, photonics, nanotechnology, and material science, this book provides a broad and accurate description of the main developments and achievements in the lab-on-fiber technology roadmap, also highlighting the new perspectives and challenges to be faced. This book is essential for scientists interested in the cutting-edge fiber optic technology, but also for graduate students.
Sol-Gel Techniques for Glass Producers and Users provides technological information, descriptions and characterizations of prototypes, or products already on the market, and illustrates advantages and disadvantages of the sol-gel process in comparison to other methods. The first chapter entitled "Wet Chemical Technology" gives a summary of the basic principles of the sol-gel chemistry. The most promising applications are related to coatings. Chapter 2 describes the various "Wet Chemical Coating Technologies" from glass cleaning to many deposition and post-coating treatment techniques. These include patterning of coatings through direct or indirect techniques which have became very important and for which the sol-gel processing is particularly well adapted. Chapter 3 entitled "Bulk Glass Technologies" reports on the preparation of special glasses for different applications. Chapter 4 entitled "Coatings and Materials Properties" describes the properties of the different coatings and the sol-gel materials, fibers and powders. The chapter also includes a section dedicated to the characterization techniques especially applied to sol-gel coatings and products.
This text is a companion volume to Transmission Electron Microscopy: A Textbook for Materials Science by Williams and Carter. The aim is to extend the discussion of certain topics that are either rapidly changing at this time or that would benefit from more detailed discussion than space allowed in the primary text. World-renowned researchers have contributed chapters in their area of expertise, and the editors have carefully prepared these chapters to provide a uniform tone and treatment for this exciting material. The book features an unparalleled collection of color figures showcasing the quality and variety of chemical data that can be obtained from today’s instruments, as well as key pitfalls to avoid. As with the previous TEM text, each chapter contains two sets of questions, one for self assessment and a second more suitable for homework assignments. Throughout the book, the style follows that of Williams & Carter even when the subject matter becomes challenging—the aim is always to make the topic understandable by first-year graduate students and others who are working in the field of Materials Science Topics covered include sources, in-situ experiments, electron diffraction, Digital Micrograph, waves and holography, focal-series reconstruction and direct methods, STEM and tomography, energy-filtered TEM (EFTEM) imaging, and spectrum imaging. The range and depth of material makes this companion volume essential reading for the budding microscopist and a key reference for practicing researchers using these and related techniques.