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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
To honour W C R”ntgen and review the entire area of X-ray development in the various fields of natural, technical, and life sciences, his successors at the Physikalisches Institut of the Universit„t Wrzburg organized a conference, named ?R”ntgen Centennial?. It took place at the new ?Physikalisches Institut? not far from the historical site shortly before the actual 100th anniversary of the discovery. Over forty renowned scientists were invited as representative speakers in the various subfields of X-ray activities. They reviewed the development, gave examples, and described the present status. Most of them provided survey articles, which are gathered in this book. Since most X-ray-related activities are somehow represented, an almost complete overview of the entire field is provided. This book thus represents the enormous breadth of X-ray activities and allows one to recognize the potential and quality of today's X-ray research.
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium