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The introduction of the ISO 9000 quality standard resulted in renewed interest and pressure on industry to strengthen their quality and metrology standards. To meet this renewed interest Practical Density Measurement and Hydrometry provides invaluable, contemporary information on mass metrology. The book highlights the principles of physics involved and the technology needed to accurately measure the density of solids and liquids to high precision to meet the increasing demands on the metrology industry. Starting with national and international density standards, the book proceeds to discuss the variety of methods used to accurately measure solid and liquid density, to compare and contrast these techniques, and to thoroughly explain the thermal dilation of liquids. It also examines interferometers used in dimensional measurements of solid-based density standards, corrections applicable due to finite aperture, phase change due to reflection and ringing, and special methods for density determination. The final chapters detail specific points of relevance to density measurements and hydrometry for materials commonly used in industry. Complimented with practical guidance on applying these measurement techniques, calibration procedures, and data tables, this book is an essential reference for metrologists and a valuable introduction for graduate students.
The Instrument and Automation Engineers’ Handbook (IAEH) is the Number 1 process automation handbook in the world. The two volumes in this greatly expanded Fifth Edition deal with measurement devices and analyzers. Volume one, Measurement and Safety, covers safety sensors and the detectors of physical properties, while volume two, Analysis and Analysis, describes the measurement of such analytical properties as composition. Complete with 245 alphabetized chapters and a thorough index for quick access to specific information, the IAEH, Fifth Edition is a must-have reference for instrument and automation engineers working in the chemical, oil/gas, pharmaceutical, pollution, energy, plastics, paper, wastewater, food, etc. industries.
This handbook is dedicated to the next generation of automation engineers working in the fields of measurement, control, and safety, describing the sensors and detectors used in the measurement of process variables.
Unsurpassed in its coverage, usability, and authority since its first publication in 1969, the three-volume Instrument Engineers' Handbook continues to be the premier reference for instrument engineers around the world. It helps users select and implement hundreds of measurement and control instruments and analytical devices and design the most cost-effective process control systems that optimize production and maximize safety. Now entering its fourth edition, Volume 1: Process Measurement and Analysis is fully updated with increased emphasis on installation and maintenance consideration. Its coverage is now fully globalized with product descriptions from manufacturers around the world. Béla G. Lipták speaks on Post-Oil Energy Technology on the AT&T Tech Channel.
This new edition of the bestselling Measurement, Instrumentation, and Sensors Handbook brings together all aspects of the design and implementation of measurement, instrumentation, and sensors. Reflecting the current state of the art, it describes the use of instruments and techniques for performing practical measurements in engineering, physics, chemistry, and the life sciences; explains sensors and the associated hardware and software; and discusses processing systems, automatic data acquisition, reduction and analysis, operation characteristics, accuracy, errors, calibrations, and the incorporation of standards for control purposes. Organized according to measurement problem, the Second Edition: Consists of 2 volumes Features contributions from 240+ field experts Contains 53 new chapters, plus updates to all 194 existing chapters Addresses different ways of making measurements for given variables Emphasizes modern intelligent instruments and techniques, human factors, modern display methods, instrument networks, and virtual instruments Explains modern wireless techniques, sensors, measurements, and applications A concise and useful reference for engineers, scientists, academic faculty, students, designers, managers, and industry professionals involved in instrumentation and measurement research and development, Measurement, Instrumentation, and Sensors Handbook, Second Edition provides readers with a greater understanding of advanced applications.
This book fulfills the global need to evaluate measurement results along with the associated uncertainty. In the book, together with the details of uncertainty calculations for many physical parameters, probability distributions and their properties are discussed. Definitions of various terms are given and will help the practicing metrologists to grasp the subject. The book helps to establish international standards for the evaluation of the quality of raw data obtained from various laboratories for interpreting the results of various national metrology institutes in an international inter-comparisons. For the routine calibration of instruments, a new idea for the use of pooled variance is introduced. The uncertainty calculations are explained for (i) independent linear inputs, (ii) non-linear inputs and (iii) correlated inputs. The merits and limitations of the Guide to the Expression of Uncertainty in Measurement (GUM) are discussed. Monte Carlo methods for the derivation of the output distribution from the input distributions are introduced. The Bayesian alternative for calculation of expanded uncertainty is included. A large number of numerical examples is included.
The Second Edition of the bestselling Measurement, Instrumentation, and Sensors Handbook brings together all aspects of the design and implementation of measurement, instrumentation, and sensors. Reflecting the current state of the art, it describes the use of instruments and techniques for performing practical measurements in engineering, physics, chemistry, and the life sciences and discusses processing systems, automatic data acquisition, reduction and analysis, operation characteristics, accuracy, errors, calibrations, and the incorporation of standards for control purposes. Organized according to measurement problem, the Spatial, Mechanical, Thermal, and Radiation Measurement volume of the Second Edition: Contains contributions from field experts, new chapters, and updates to all 96 existing chapters Covers instrumentation and measurement concepts, spatial and mechanical variables, displacement, acoustics, flow and spot velocity, radiation, wireless sensors and instrumentation, and control and human factors A concise and useful reference for engineers, scientists, academic faculty, students, designers, managers, and industry professionals involved in instrumentation and measurement research and development, Measurement, Instrumentation, and Sensors Handbook, Second Edition: Spatial, Mechanical, Thermal, and Radiation Measurement provides readers with a greater understanding of advanced applications.
This book delivers a comprehensive overview of units of measurement. Beginning with a historical look at metrology in Ancient India, the book explains fundamental concepts in metrology such as basic, derived and dimensionless quantities, and introduces the concept of quantity calculus. It discusses and critically examines various three and four-dimensional systems of units used both presently and in the past, while explaining why only four base units are needed for a system of measurement. It discusses the Metre Convention as well as the creation of the International Bureau of Weights and Measures, and gives a detailed look at the evolution of the current SI base units of time, length, mass, electric current, temperature, intensity of illumination and substance. This updated second edition is extended with timely new chapters discussing past efforts to redefine the SI base units as well as the most recent 2019 redefinitions based entirely on the speed of light and other fundamental physical constants. Additionally, it provides biographical presentations of many of the historical figures behind commonly used units of measurements, such as Newton, Joule and Ohm, With its accessible and comprehensive treatment of the field, together with its unique presentation of the underlying history, this book is well suited to any student and researcher interested in the practical and historical aspects of the field of metrology.
This book describes the significance of metrology for inclusive growth in India and explains its application in the areas of physical–mechanical engineering, electrical and electronics, Indian standard time measurements, electromagnetic radiation, environment, biomedical, materials and Bhartiya Nirdeshak Dravyas (BND®). Using the framework of “Aswal Model”, it connects the metrology, in association with accreditation and standards, to the areas of science and technology, government and regulatory agencies, civil society and media, and various other industries. It presents critical analyses of the contributions made by CSIR-National Physical Laboratory (CSIR-NPL), India, through its world-class science and apex measurement facilities of international equivalence in the areas of industrial growth, strategic sector growth, environmental protection, cybersecurity, sustainable energy, affordable health, international trade, policy-making, etc. The book will be useful for science and engineering students, researchers, policymakers and entrepreneurs.
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP