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This is the key publication for professionals and students in the metallurgy and foundry field. Fully revised and expanded, Castings Second Edition covers the latest developments in the understanding of the role of the liquid metal in controlling the properties of cast materials, and indeed, of all metallic materials that have started in the cast form. Practising foundry engineers, designers, and students will find the revealing insights into the behaviour of castings essential in developing their inderstanding and practice. John Campbell OBE is a leading international figure in the castings industry, with over four decades of experience. He is the originator of the Cosworth Casting Process, the pre-eminent production process for automobile cylinder heads and blocks. He is also co-inventor of both the Baxi Casting Process (now owned by Alcoa) developed in the UK, and the newly emerging Alotech Casting Process in the USA. He is Professor of Casting Technology at the University of Birmingham, UK. New edition of this internationally respected reference and textbook for engineers and students Develops understanding of the concepts and practice of casting operations Castings' is the key work on castings technology and process metallurgy, and an essential resource on contemporary developments and thinking on the new metallurgy of cast alloys Revised and updated throughout, with new material on subjects including surface turbulence, the new theory of entrainment defects including folded film defects, plus the latest concepts of alloy theory
This volume Structure of Free Polyatomic Molecules Basic Data contains frequently used data from the corresponding larger Landolt-Börnstein handbooks in a low price book for the individual scientists working in the laboratory. Directories link to the more complete volumes in the library. The book contains important information about a large number of semiconductors.
The characterization of epitaxial layers and their surfaces has benefitted a lot from the enormous progress of optical analysis techniques during the last decade. In particular, the dramatic improvement of the structural quality of semiconductor epilayers and heterostructures results to a great deal from the level of sophistication achieved with such analysis techniques. First of all, optical techniques are nondestructive and their sensitivity has been improved to such an extent that nowadays the epilayer analysis can be performed on layers with thicknesses on the atomic scale. Furthermore, the spatial and temporal resolution have been pushed to such limits that real time observation of surface processes during epitaxial growth is possible with techniques like reflectance difference spectroscopy. Of course, optical spectroscopies complement techniques based on the inter action of electrons with matter, but whereas the latter usually require high or ultrahigh vacuum conditions, the former ones can be applied in different environments as well. This advantage could turn out extremely important for a rather technological point of view, i.e. for the surveillance of modern semiconductor processes. Despite the large potential of techniques based on the interaction of electromagnetic waves with surfaces and epilayers, optical techniques are apparently moving only slowly into this area of technology. One reason for this might be that some prejudices still exist regarding their sensitivity.
While bits and pieces of the index of refraction n and extinction coefficient k for a given material can be found in several handbooks, the Handbook of Optical Constants of Solids gives for the first time a single set of n and k values over the broadest spectral range (ideally from x-ray to mm-wave region). The critiquers have chosen the numbers for you, based on their own broad experience in the study of optical properties. Whether you need one number at one wavelength or many numbers at many wavelengths, what is available in the literature is condensed down into a single set of numbers. Contributors have decided the best values for n and k References in each critique allow the reader to go back to the original data to examine and understand where the values have come from Allows the reader to determine if any data in a spectral region needs to be filled in Gives a wide and detailed view of experimental techniques for measuring the optical constants n and k Incorporates and describes crystal structure, space-group symmetry, unit-cell dimensions, number of optic and acoustic modes, frequencies of optic modes, the irreducible representation, band gap, plasma frequency, and static dielectric constant