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This and its companion Volume 2 document the proceedings of the International Symposium on Physicochemical Aspects of Polymer Surfaces held under the auspices of the American Chemical Society in New York City, August 23-28, 1981. This event was sponsored by the Division of Colloid and Surface Chemistry and the Divisions of Organic Coatings and Plastics Chemistry, and Industrial and Engineering Chemistry were the cosponsors. The study of polymer surfaces is important from both funda mental and applied points of view. The applications of polymers are legion and wheresoever polymers are used, their surface char acteristics, inter alia, are of great concern and importance; and the areas where polymers find applications range from microelec tronics to prosthetics. In the last decade or so, the availabil ity of various sophisticated surface analytical techniques, par ticularly ESCA, has been a boon in enhancing our knowledge of polymer surfaces. This Symposium was designed to bring together scientists and technologists interested in all aspects of polymer surfaces, to provide a forum for discussion of various ramifications of poly mer surfaces, to discover the latest developments, to provide an opportunity for cross-pollination of ideas, and to highlight areas which are in astate of rapid development and those which need intensified efforts. If the comments from attendees is any barometer of the success of an event, then this Symposium was a grand success and the above objectives were amply fulfilled.
Polymer Surfaces - From Physics to Technology is divided into four main sections. Firstly the origins and physical principles governing the properties of polymer surfaces are considered. Next the authors discuss methods of characterization, particularly spectroscopic, and those connected to surface energetics.
This fully updated edition provides a broad approach to the surface analysis of polymers being of high technological interest. Modern analytical techniques, potential applications and recent advances in instrumental apparatus are discussed. The self-consistent chapters are devoted to techniques from photoelectron spectroscopy to electron microscopies and wettability.