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Since process variation and chip performance uncertainties have become more pronounced as technologies scale down into the nanometer regime, accurate and efficient modeling or characterization of variations from the device to the architecture level have become imperative for the successful design of VLSI chips. This book provides readers with tools for variation-aware design methodologies and computer-aided design (CAD) of VLSI systems, in the presence of process variations at the nanometer scale. It presents the latest developments for modeling and analysis, with a focus on statistical interconnect modeling, statistical parasitic extractions, statistical full-chip leakage and dynamic power analysis considering spatial correlations, statistical analysis and modeling for large global interconnects and analog/mixed-signal circuits. Provides readers with timely, systematic and comprehensive treatments of statistical modeling and analysis of VLSI systems with a focus on interconnects, on-chip power grids and clock networks, and analog/mixed-signal circuits; Helps chip designers understand the potential and limitations of their design tools, improving their design productivity; Presents analysis of each algorithm with practical applications in the context of real circuit design; Includes numerical examples for the quantitative analysis and evaluation of algorithms presented. Provides readers with timely, systematic and comprehensive treatments of statistical modeling and analysis of VLSI systems with a focus on interconnects, on-chip power grids and clock networks, and analog/mixed-signal circuits; Helps chip designers understand the potential and limitations of their design tools, improving their design productivity; Presents analysis of each algorithm with practical applications in the context of real circuit design; Includes numerical examples for the quantitative analysis and evaluation of algorithms presented.
This book provides comprehensive coverage of the recent advances in symbolic analysis techniques for design automation of nanometer VLSI systems. The presentation is organized in parts of fundamentals, basic implementation methods and applications for VLSI design. Topics emphasized include statistical timing and crosstalk analysis, statistical and parallel analysis, performance bound analysis and behavioral modeling for analog integrated circuits. Among the recent advances, the Binary Decision Diagram (BDD) based approaches are studied in depth. The BDD-based hierarchical symbolic analysis approaches, have essentially broken the analog circuit size barrier.
This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent developments in the modeling, analysis and optimization of the reliability effects from EM and BTI induced failures at the circuit, architecture and system levels of abstraction. Readers will benefit from a focus on topics such as recently developed, physics-based EM modeling, EM modeling for multi-segment wires, new EM-aware power grid analysis, and system level EM-induced reliability optimization and management techniques. Reviews classic Electromigration (EM) models, as well as existing EM failure models and discusses the limitations of those models; Introduces a dynamic EM model to address transient stress evolution, in which wires are stressed under time-varying current flows, and the EM recovery effects. Also includes new, parameterized equivalent DC current based EM models to address the recovery and transient effects; Presents a cross-layer approach to transistor aging modeling, analysis and mitigation, spanning multiple abstraction levels; Equips readers for EM-induced dynamic reliability management and energy or lifetime optimization techniques, for many-core dark silicon microprocessors, embedded systems, lower power many-core processors and datacenters.
Process variability is the pivotal factor impacting the design of high yield integrated circuits and systems in deep sub-micron CMOS technologies. The electrical and physical properties of transistors and interconnects, the building blocks of integrated circuits, are prone to significant variations that directly impact the performance and power consumption of the fabricated devices, severely impacting the manufacturing yield. However, the large number of the transistors on a single chip adds even more challenges for the analysis of the variation effects, a critical task in diagnosing the cause of failure and designing for yield. Reliable and efficient statistical analysis methodologies in various design phases are key to predict the yield before entering such an expensive fabrication process. In this thesis, the impacts of process variations are examined at three different levels: device, circuit, and micro-architecture. The variation models are provided for each level of abstraction, and new methodologies are proposed for efficient statistical analysis and design under variation.
Covers the statistical analysis and optimization issues arising due to increased process variations in current technologies. Comprises a valuable reference for statistical analysis and optimization techniques in current and future VLSI design for CAD-Tool developers and for researchers interested in starting work in this very active area of research. Written by author who lead much research in this area who provide novel ideas and approaches to handle the addressed issues
As IC technologies scale to the nanometer regime, efficient and accurate modeling and analysis of VLSI systems with billions of transistors and interconnects becomes increasingly critical and difficult. VLSI systems impacted by the increasingly high dimensional process-voltage-temperature (PVT) variations demand much more modeling and analysis efforts than ever before, while the analysis of large scale on-chip interconnects that requires solving tens of millions of unknowns imposes great challenges in computer aided design areas. This dissertation presents new methodologies for addressing the above two important challenging issues for large scale on-chip interconnect modeling and analysis: In the past, the standard statistical circuit modeling techniques usually employ principal component analysis (PCA) and its variants to reduce the parameter dimensionality. Although widely adopted, these techniques can be very limited since parameter dimension reduction is achieved by merely considering the statistical distributions of the controlling parameters but neglecting the important correspondence between these parameters and the circuit performances (responses) under modeling. This dissertation presents a variety of performance-oriented parameter dimension reduction methods that can lead to more than one order of magnitude parameter reduction for a variety of VLSI circuit modeling and analysis problems. The sheer size of present day power/ground distribution networks makes their analysis and verification tasks extremely runtime and memory inefficient, and at the same time, limits the extent to which these networks can be optimized. Given today?s commodity graphics processing units (GPUs) that can deliver more than 500 GFlops (Flops: floating point operations per second). computing power and 100GB/s memory bandwidth, which are more than 10X greater than offered by modern day general-purpose quad-core microprocessors, it is very desirable to convert the impressive GPU computing power to usable design automation tools for VLSI verification. In this dissertation, for the first time, we show how to exploit recent massively parallel single-instruction multiple-thread (SIMT) based graphics processing unit (GPU) platforms to tackle power grid analysis with very promising performance. Our GPU based network analyzer is capable of solving tens of millions of power grid nodes in just a few seconds. Additionally, with the above GPU based simulation framework, more challenging three-dimensional full-chip thermal analysis can be solved in a much more efficient way than ever before.
Recently the world celebrated the 60th anniversary of the invention of the first transistor. The first integrated circuit (IC) was built a decade later, with the first microprocessor designed in the early 1970s. Today, ICs are a part of nearly every aspect of our daily lives. They help us live longer and more comfortably, and do more, faster. All this is possible because of the relentless search for new materials, circuit designs, and ideas happening on a daily basis at industrial and academic institutions around the globe. Showcasing the latest advances in very-large-scale integrated (VLSI) circuits, VLSI: Circuits for Emerging Applications provides a balanced view of industrial and academic developments beyond silicon and complementary metal–oxide–semiconductor (CMOS) technology. From quantum-dot cellular automata (QCA) to chips for cochlear implants, this must-have resource: Investigates the trend of combining multiple cores in a single chip to boost performance of the overall system Describes a novel approach to enable physically unclonable functions (PUFs) using intrinsic features of a VLSI chip Examines the VLSI implementations of major symmetric and asymmetric key cryptographic algorithms, hash functions, and digital signatures Discusses nonvolatile memories such as resistive random-access memory (Re-RAM), magneto-resistive RAM (MRAM), and floating-body RAM (FB-RAM) Explores organic transistors, soft errors, photonics, nanoelectromechanical (NEM) relays, reversible computation, bioinformatics, asynchronous logic, and more VLSI: Circuits for Emerging Applications presents cutting-edge research, design architectures, materials, and uses for VLSI circuits, offering valuable insight into the current state of the art of micro- and nanoelectronics.
iming, timing, timing! That is the main concern of a digital designer charged with designing a semiconductor chip. What is it, how is it T described, and how does one verify it? The design team of a large digital design may spend months architecting and iterating the design to achieve the required timing target. Besides functional verification, the t- ing closure is the major milestone which dictates when a chip can be - leased to the semiconductor foundry for fabrication. This book addresses the timing verification using static timing analysis for nanometer designs. The book has originated from many years of our working in the area of timing verification for complex nanometer designs. We have come across many design engineers trying to learn the background and various aspects of static timing analysis. Unfortunately, there is no book currently ava- able that can be used by a working engineer to get acquainted with the - tails of static timing analysis. The chip designers lack a central reference for information on timing, that covers the basics to the advanced timing veri- cation procedures and techniques.