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This title is part of UC Press's Voices Revived program, which commemorates University of California Press’s mission to seek out and cultivate the brightest minds and give them voice, reach, and impact. Drawing on a backlist dating to 1893, Voices Revived makes high-quality, peer-reviewed scholarship accessible once again using print-on-demand technology. This title was originally published in 1972.
VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.
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The Army Materials and Mechanics Research Center of Water town, Massachusetts in cooperation with the Materials Science Group of the Department of Chemical Engineering and Materials Science of Syracuse University has conducted the Sagamore Army Materials Research Conference since 1954. The main purpose of these conferences has been to gather together over 150 scientists and engineers from academic institutions, industry and government who are uniquely qualified to explore in depth a subject of importance to the Department of Defense, the Army and the scientific community. This volume NONDESTRUCTIVE EVALUATION OF MATERIALS, addresses the areas of x-ray, ultrasonics and other methods of nondestructive testing. We wish to acknowledge the dedicated assistance of Joseph M. Bernier of the Army Materials and Mechanics Research Center and Helen Brown DeMascio of Syracuse University throughout the stages of the conference planning and finally the publication of this book. Their help is deeply appreciated. Syracuse University Syracuse, New York The Editors Contents SESSION I X-RAY S. Heissman, Moderator H. K. Herglotz, Moderator 1. Overview of X-Ray Diffraction Methods for Nondestructive Testing • • • • • • • ••• 1 L. V. Azaroff 2. Detection of Fatigue Damage by X-Rays 21 S. Taira and K. Kamachi 3. A Historical Example of Fatigue Damage • • • • • • • 55 H. K. Herglotz 4. The Application of X-Ray Topography to Materials Science . . . . . . . . . . . . . . . . . . . . 69 S. Weissman 5.
Specialist Periodical Reports provide systematic and detailed review coverage of progress in the major areas of chemical research. Written by experts in their specialist fields the series creates a unique service for the active research chemist, supplying regular critical in-depth accounts of progress in particular areas of chemistry. For over 90 years The Royal Society of Chemistry and its predecessor, the Chemical Society, have been publishing reports charting developments in chemistry, which originally took the form of Annual Reports. However, by 1967 the whole spectrum of chemistry could no longer be contained within one volume and the series Specialist Periodical Reports was born. The Annual Reports themselves still existed but were divided into two, and subsequently three, volumes covering Inorganic, Organic and Physical Chemistry. For more general coverage of the highlights in chemistry they remain a 'must'. Since that time the SPR series has altered according to the fluctuating degree of activity in various fields of chemistry. Some titles have remained unchanged, while others have altered their emphasis along with their titles; some have been combined under a new name whereas others have had to be discontinued. The current list of Specialist Periodical Reports can be seen on the inside flap of this volume.
In solid state physics and in materials science the investigation of the connection between the properties of solids and their microstructure is of major importance. For crystalline materials this connection is related to the lattice structure, and it can be shown convinc ingly that the material properties depend on deviations from the ideal lattice structure in the majority of cases. For this reason a reliable detection and analysis of defects in "nearly perfect" crystals is necessary, and a sufficient spatial resolution of the methods applied is required. Because electrons on the one hand strongly interact with the matter to be investigated and on the other hand can easily be focused electron-optical methods are very advantageous for this purpose. They are used in the diffraction mode, in the imaging mode and in the spectroscopic mode. The attainable high lateral resolution in the imaging mode makes the application of electron microscopy especially effective. Although already valuable information on crystal defects can be gained by using the routine technique of diffraction contrast imagingl-3) which has a resolution of some 4 10 nm - in the special weak-beam technique ) of some nm -, the detection of crystal defects and inhomogeneities, resp. on an atomic or molecular level by the aid of high resolution electron microscopy gets increasing importance.