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The book focuses on the extension of quality-assured measurement and metrology into psychological and social domains. This is not only feasible and achievable, but also a pressing concern. Significant progress in developing a common conceptual system for measurement across the sciences has been made in recent collaborations between metrologists and psychometricians, as reported in the chapters of this book. Modeling, estimation, and interpretation of objectively reproducible unit quantities that support both general comparability and adaptation to unique local circumstances are demonstrated in fields as diverse as artificial intelligence, justice, and beauty perception.
Systems, Models and Measures seeks to bridge the gap between the 'classical' and the newer technologies by constructing a systematic measurement framework for both. The authors use their experience as consultants in systems, software and quality engineering to take the subject from concept and theory, via strategy and procedure, to tools and applications. The book clarifies the key notions of system, model, measurement, product, process, specification and design. Practical examples demonstrate the 'architecture' of measurement schemes, extending them to object-oriented and subjective measurement. A detailed case study provides a measurement strategy for formal specifications, including Prolog, Z and VDM. The reader will be able to formulate problems in measurable terms, appraise and compare formal specifications, assess and enhance existing measurement practices, and devise measurement schemes for describing objective characteristics and expressing value judgements.
Diagnostic characterization techniques for semiconductor materials, devices and device processing are addressed at this symposium. It will cover new techniques as well as advances in routine analytical technology applied to semiconductor process development and manufacture. The hardcover edition includes a CD-ROM of ECS Transactions, Volume 10, Issue 1, Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007). The PDF edition also includes the ALTECH 2007 papers.
The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.