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This book explains the basic elements that readers need to know about amorphous silicon material and a-Si:H TFTs. It includes the main principles of the transistors operation, modeling and applications. Fundamentals about transport mechanisms in a-Si:H TFTs and the associated electronic properties are introduced and extended to design examples and strategies to build reliable, large-area, performance optimized circuits. The book also reviews the effect of the amorphous silicon nature and how it impacts the transistors properties and their relevant applications. Fundamentals are made as simple as possible to be easily grasped as they cover everything expected to be important for an easy understanding of the introduced concepts. The author’s approach is geared toward undergraduate and graduate students, but the content is also appropriate for circuit simulator developers, integrated circuit designers and manufacturers, as well as everyone engaged in work on large area integrated circuit technologies and photovoltaics.
The objective of the research presented herein is to elucidate the effect of traps in determining amorphous oxide semiconductor thin-film transistor (AOS TFT) performance using modeling and characterization. A novel method is proposed to extract the interface state distribution from a TFT transfer curve. Analysis of zinc-indium oxide (ZIO), zinc-tin oxide (ZTO), and indium-gallium-zinc oxide (IGZO) TFTs reveals an interface state distribution of ~1011- 1012 cm−2 eV−1 and that the interface state density is negligible compared to the density of free electrons in the accumulation layer beyond a surface potential of ~0.3 V. Technology computer-aided design (TCAD) simulation is employed in order to assess IGZO TFT non-ideal electrical characteristics involving different types of charge and/or traps. TCAD simulation reveals that negative charge placed at the backside (ungated) surface or frontside (gated) interface shifts a transfer curve to the right (left) because of depletion (accumulation) of the channel. A two-layer model attempts to address ultrathin channel layer trends. A new methodology for accomplishing capacitance-voltage (C-V) assessment of AOS channel layers is proposed. It is asserted that meaningful C-V analysis can only be accomplished using a quasi-static method and an insulating substrate. Properly conducted C-V measurements can be used to estimate the flat-band voltage, the effective donor density in an AOS channel layer, the channel layer surface potential, and the conduction band-tail state density and Urbach energy.
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.