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Proceedings of the NATO Advanced Study Institute on Materials Modification by High-Fluence Ion Beams, Viana do Castelo, Portugal, August 24-September 4, 1987
This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural panels and to combine several of these properties in other applications. Surface engineering is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both coating and modification of the surface by ion implantation and laser beam melting. In recent years a continuously growing number of these techniques were developed to the extent that it became more and more difficult to maintain an overlook and to understand which of these highly differentiated techniques might be applied to resolve a given surface engineering problem. A similar development is also occuring for surface characterization techniques. This volume contains contributions from renowned scientists and engineers to the Eurocourse the aim of which was to inform about the various techniques and to give a comprehensive survey of the latest development on this subject.
Many aspects of the interaction of radiation with glasses are reviewed in this volume, with contributions from a broad scientific community. Several of the papers focus on the interdisciplinary approach required to connect technological applications to the basic interactions of energetic ions with insulators, reporting on the challenging problems that still remain to be solved. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry. The proceedings represent an ideal bridge between the sixth and the planned seventh International Conference on Radiation Effects in Insulators to be held in Japan in 1993.
Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
The design and study of materials is a pivotal component to new discoveries in the various fields of science and technology. By better understanding the components and structures of materials, researchers can increase their applications across different industries. Emerging Synthesis Techniques for Luminescent Materials is a critical scholarly resource that explores the important field of emerging synthesis techniques of luminescent materials and its practical applications. Featuring coverage on a broad range of topics such as electroluminescence, glow curve analysis, and upconversion, this book is geared towards engineers, academics, researchers, students, professionals, and practitioners seeking current research on photoluminescence and the study of rare earth doped phosphors.
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.