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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Laser materials interaction and processing is an established and growing field within the materials science community. By taking a detailed look at the fundamentals of laser matter interaction, Recent Advances in Laser Processing of Materials charts the recent progress of laser materials interaction and processing in various emerging materials science domains. With special emphasis placed on nanostructures and future developments, this book provides an interdisciplinary support for basic and applied photo-assisted processing research. Coverage includes: - laser assisted synthesis of new materials (nanoparticles, nanotubes, active molecules, new phases...) - laser assisted surface transformation (nanostructuring, lithography, etching...) - laser assisted bulk material transformation (doping, marking, crystallisation...) - Laser assisted synthesis of new materials (nanoparticles, nanotubes, active molecules, new phases...) - Laser assisted surface transformation (nanostructuring, lithography, etching...) - Laser assisted bulk material transformation (doping, marking, crystallisation...)
Gain an introduction to the concepts behind semiconductor materials and devices in this advanced textbook Semiconductors are the foundation of the electronics industry, and are therefore embedded in virtually all modern technology. No engineer or materials scientist can be without an understanding of this essential field. Since semiconductors are also the foundation of solar cells, they play an increasingly critical role in the transition to sustainable technology and promise, as a result, to become even more central in global technological progress. Fundamentals of Semiconductor Materials and Devices is a textbook that presents the advanced principles underlying semiconductors in an accessible and comprehensive way. Combining material from both engineering and physics, it remains grounded throughout in practical applications of semiconductors. Its approach makes it ideal for readers looking to gain a thorough understanding of this ubiquitous technology. Fundamentals of Semiconductor Materials and Devices readers will also find: Questions and exercises to stimulate learning and increase comprehension Introductory chapters detailing the fundamentals of quantum and solid state physics, as well as the foundational principles of semiconductor tech Detailed analysis of topics including flash memory, the quantum dot, two-dimensional semiconductor materials, and more Fundamentals of Semiconductor Materials and Devices is a valuable guide for students and researchers in any area of engineering, physics, or materials science.
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
This book discusses the early stages of the development of nanostructures, including synthesis techniques, growth mechanisms, the physics and chemistry of nanostructured materials, various innovative characterization techniques, the need for functionalization and different functionalization methods as well as the various properties of nanostructured materials. It focuses on the applications of nanostructured materials, such as mechanical applications, nanoelectronics and microelectronic devices, nano-optics, nanophotonics and nano-optoelectronics, as well as piezoelectric, agriculture, biomedical and, environmental remediation applications, and anti-microbial and antibacterial properties. Further, it includes a chapter on nanomaterial research developments, highlighting work on the life-cycle analysis of nanostructured materials and toxicity aspects.
Written by the department head of materials science and engineering at MIT, this concise and stringent introduction takes readers from the fundamental theory to in-depth knowledge. It sets out with a theoretical scheme for the design of desirable periodic structures, then presents the experimental techniques that allow for fabrication of the periodic structure and exemplary experimental data. Subsequently, theory and numerical data are used to demonstrate how these periodic structures control the photonic, acoustic, and mechanical properties of materials, concluding with examples from these three important fields of applications. The result is must-have knowledge for both beginners and veterans in the field.
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.
Laser Fundamentals provides a clear and comprehensive introduction to the physical and engineering principles of laser operation and design. Simple explanations, based throughout on key underlying concepts, lead the reader logically from the basics of laser action to advanced topics in laser physics and engineering. Much new material has been added to this second edition, especially in the areas of solid-state lasers, semiconductor lasers, and laser cavities. This 2004 edition contains a new chapter on laser operation above threshold, including extensive discussion of laser amplifiers. The clear explanations, worked examples, and many homework problems will make this book invaluable to undergraduate and first-year graduate students in science and engineering taking courses on lasers. The summaries of key types of lasers, the use of many unique theoretical descriptions, and the extensive bibliography will also make this a valuable reference work for researchers.