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This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.
Chemical Thermodynamics for Industry presents the latest developments in applied thermodynamics and highlights the role of thermodynamics in the chemical industry. Written by leading experts in the field, Chemical Thermodynamics for Industry covers the latest developments in traditional areas such as calorimetry, microcalorimetry, transport properties, crystallization, adsorption, electrolyte systems and transport fuels, It highlights newly established areas such as multiphase modeling, reactive distillation, non-equilibrium thermodynamics and spectro-calorimetry. It also explores new ways of treating old technologies as well as new and potentially important areas such as ionic liquids, new materials, ab-initia quantum chemistry, nano-particles, polymer recycling, clathrates and the economic value of applied thermodynamics. This book is aimed not only at those working in a specific area of chemical thermodynamics but also at the general chemist, the prospective researcher and those involved in funding chemical research.
This comprehensive, handbook-style survey of diffusion in condensed matter gives detailed insight into diffusion as the process of particle transport due to stochastic movement. It is understood and presented as a phenomenon of crucial relevance for a large variety of processes and materials. In this book, all aspects of the theoretical fundamentals, experimental techniques, highlights of current developments and results for solids, liquids and interfaces are presented.
My 12-year-old granddaughter Nina Alesi once asked me, "Grandpa, you are a scientist at IBM, so what do you do?" I tried to reply, "Oh, I watch atoms move. . . " But before I could finish this sentence, my 7-year-old grandson Vinnie interjected, "Grandpa, do atoms play soccer?" This book is about the games atoms play in diffusion and various other properties of materials. While diffusion has been studied for more than 100 years in solids, its importance, excitement, and intellectual chal lenges remain undiminished with time. It is central to understanding the relationship between the structure and properties of naturally occurring and synthetic materials, which is at the root of current technological development and innovations. The diversity of material has led to spec tacular progress in functional inorganics, polymers, granular materials, photonics, complex oxides, metallic glasses, quasi-crystals, and strongly correlated electronic materials. The integrity of complex materials pack ages is determined by diffusion, a highly interactive and synergic phe nomenon that interrelates to the microstructure, the microchemistry, and the superimposed physical fields. While the various physico-chemical properties of the materials are affected by diffusion, they determine diffu sion itself. This book, which is intended to document the diffusive processes operative in advanced technological materials, has been written by pio neers in industry and academia.
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
This new volume covers the latest developments in the field of electrochemistry. It addresses a variety of topics including new materials development, materials synthesis, processing, characterization, property measurements, structure-property relationships, and device performance. A broader view of various electrochemical energy conversion devices make this book a critical read for scientists and engineers working in related fields. Papers from the symposium at the 102nd Annual Meeting of The American Ceramic Society, April 29-May 3, 2000, Missouri and the 103rd Annual Meeting, April 22-25, 2001, Indiana.
This book is a unique collection of experimental data in the field of internal friction, anelastic relaxation, and damping properties of metallic materials. It reviews virtually all anelastic relaxation phenomena ever published. The reader is also supplied with explanations of the basic physical mechanisms of internal friction, a summary of typical effects for different groups of metals, and more than 2000 references to original papers.