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The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.
Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
Spectroscopy, Diffraction and Tomography in Art and Heritage Science gives an overview of the main spectroscopy and diffraction techniques currently available for cultural heritage research. It starts with an introductory, general discussion of spectroscopy and diffraction and the kinds of information they can give. Further sections deal with, respectively, typical laboratory methods, mobile equipment, and large-scale instruments and infrastructural methods. The work concludes with comments on combining and comparing multiple techniques, sources of error, and limitations of the analytical methods. Explains spectroscopy and diffraction techniques in detail, yet remains accessible to those without a chemistry or physics background Provides explanations of commonly used terms, such as destructive, non-destructive, non-invasive, in-situ, and ex-situ, and their sometimes-misleading origins Includes real-world examples that demonstrate how each technique is used in the field Highlights the complementary use of different analytical techniques in fully interpreting the data
Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. Examines classical collision theory Details the fundamentals of five specific ion beam analysis techniques Illustrates specific applications, including biomedicine and thin film analysis Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.
Nuclear Instruments and Methods, Volume 168: Ion Beam Analysis presents the proceedings of the Fourth International Conference on Ion Beam Analysis, held in Aarhus, Denmark, on June 25–29, 1979. This book provides information pertinent to the methods and applications ion beam analysis. Organized into eight parts encompassing 95 chapters, this volume begins with an overview of the straggling of energy loss for protons and alpha particles. This text then examines the method for the calculation of the stopping of energetic ions in matter. Other chapters consider the method for measuring relative stopping powers for light energetic ions in highly reactive materials. This book discusses as well the stopping power and straggling of lithium ions with velocities around the Bohr velocity. The final chapter deals with the adsorption behavior of different gases on monocrystalline platinum surfaces. This book is a valuable resource for scientists, technologists, students, and research workers.
In this book, we have attempted to produce a reference on high resolution focused ion beams (FIBs) that will be useful for both the user and the designer of FIB instrumentation. We have included a mix of theory and applications that seemed most useful to us. The field of FIBs has advanced rapidly since the application of the first field emission ion sources in the early 1970s. The development of the liquid metal ion source (LMIS) in the late 1960s and early 1970s and its application for FIBs in the late 1970s have resulted in a powerful tool for research and for industry. There have been hundreds of papers written on many aspects of LMIS and FIBs, and a useful and informative book on these subjects was published in 1991 by Phil Prewett and Grame Mair. Because there have been so many new applications and uses found for FIBs in the last ten years we felt that it was time for another book on the subject.
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Nonlinear Wave and Plasma Structures in the Auroral and Subauroral Geospace presents a comprehensive examination of the self-consistent processes leading to multiscale electromagnetic and plasma structures in the magnetosphere and ionosphere near the plasmapause, particularly in the auroral and subauroral geospace. It utilizes simulations and a large number of relevant in situ measurements conducted by the most recent satellite missions, as well as ground-based optical and radar observations to verify the conclusions and analysis. Including several case studies of observations related to prominent geospacer events, the book also provides experimental and numerical results throughout the chapters to further enhance understanding of how the same physical mechanisms produce different phenomena at different regions of the near-Earth space environment. Additionally, the comprehensive description of mechanisms responsible for space weather effects will give readers a broad foundation of wave and particle processes in the near-Earth magnetosphere. As such, Nonlinear Wave and Plasma Structures in the Auroral and Subauroral Geospace Nonlinear Wave and Plasma Structures in the Auroral and Subauroral Geospace is a cutting-edge reference for space physicists looking to better understand plasma physics in geospace. - Presents a unified approach to wave and particle phenomena occurring in the auroral and subauroral geospace - Summarizes the most current theoretical concepts related to the generation of the large-scale electric field near the plasmapause by flows of hot plasma from the reconnection site - Includes case studies of the observations related to the most "famous events during the last 20 years as well as a large number of experimental and numerical results illustrated throughout the text
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.