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This volume provides a current treatise on the chemical and physical property modifications induced by ion beams in insulators, including applications in astrophysics, geophysics, material technology, optoelectronics, memory devices and polymers. An extensive review is given of experimental methods for the analysis of ion bombarded insulators, including optical and structural methods, resonance, energetic ion methods and surface techniques. An appendix of more than 90 pages presents the most extensive ion-range tables for insulators so far. These tables cover a wide regime of energies and a wide variety of insulating targets, including glasses and many organic and ceramics materials. The book will be of particular value to research physicists, chemists, astrophysicists and geophysicists as well as engineers interested in optoelectronics, polymers, nuclear energy and material technology.
This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Proceedings of the NATO Advanced Study Institute on Materials Modification by High-Fluence Ion Beams, Viana do Castelo, Portugal, August 24-September 4, 1987
Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
On attending a conference on the Jovian satellites at UCLA, I heard Lou Lanze rotti vigorously present the exciting data on the sputtering of water ice by Me V protons taken with W. L. Brown at AT&T Bell Labs. In his inimitable way he made clear that this new electronic sputtering process was very poorly under stood and was very important for surface properties of sattelites. I was immedia tely hooked, and have been working ever since with Lanzerotti, Brown, my col league at Virginia, John Boring, and Bo Sundqvist at Uppsala on understanding the ejection of material from surfaces and applying laboratory results to intere sting planetary problems. In the course of writing this book I also had the benefit of spending a semester with the Planetary Geosciences group in Hawaii, thanks to Tom McCord, a period of time with Doug Nash at JPL, and a period ot time with the group at Catania. The book was started with the encouragement of Lou Lanzerotti. The writing has gone slowly as the field has been changing rapidly. Even now I feel it is incom plete, as the interesting Halley dust data have just recently been interpreted in detail, Voyager has recently visited Neptune, and the data on Pluto are rapidly improving. However, most of the principles for plasma ion alteration of surfaces and gases have been established allowing, I hope, a coherent and useful frame work for incorporating both new laboratory and planetary data.
This thesis investigates the behavior of two candidate materials (a-SiO2 and MgO) for applications in fusion (e.g., the International Thermonuclear Experimental Reactor ITER) and Generation IV fission reactors. Both parts of the thesis – the development of the ionoluminescence technique and the study of the ion-irradiation effects on both materials – are highly relevant for the fields of the ion-beam analysis techniques and irradiation damage in materials. The research presented determines the microstructural changes at different length scales in these materials under ion irradiation. In particular, it studies the effect of the irradiation temperature using several advanced characterization techniques. It also provides much-needed insights into the use of these materials at elevated temperatures. Further, it discusses the development of the ion-beam-induced luminescence technique in different research facilities around the globe, a powerful in situ spectroscopic characterization method that until now was little known. Thanks to its relevance, rigorosity and quality, this thesis has received twoprestigious awards in Spain and France.