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The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.
Handbook of Modern Coating Technologies: Advanced Characterization Methods reviews advanced characterization methods of modern coating technologies. The topics in this volume consist of scanning vibrating electrode technique, spectroscopic ellipsometry, advances in X-ray diffraction, neutron reflectivity, micro- and nanoprobes, fluorescence technique, stress measurement methods in thin films, micropotentiometry, and localized corrosion studies.
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
Provides a semi-quantitative approach to recent developments in the study of optical properties of condensed matter systems Featuring contributions by noted experts in the field of electronic and optoelectronic materials and photonics, this book looks at the optical properties of materials as well as their physical processes and various classes. Taking a semi-quantitative approach to the subject, it presents a summary of the basic concepts, reviews recent developments in the study of optical properties of materials and offers many examples and applications. Optical Properties of Materials and Their Applications, 2nd Edition starts by identifying the processes that should be described in detail and follows with the relevant classes of materials. In addition to featuring four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry, the book covers: optical properties of disordered condensed matter and glasses; concept of excitons; photoluminescence, photoinduced changes, and electroluminescence in noncrystalline semiconductors; and photoinduced bond breaking and volume change in chalcogenide glasses. Also included are chapters on: nonlinear optical properties of photonic glasses; kinetics of the persistent photoconductivity in crystalline III-V semiconductors; and transparent white OLEDs. In addition, readers will learn about excitonic processes in quantum wells; optoelectronic properties and applications of quantum dots; and more. Covers all of the fundamentals and applications of optical properties of materials Includes theory, experimental techniques, and current and developing applications Includes four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry Appropriate for materials scientists, chemists, physicists and electrical engineers involved in development of electronic materials Written by internationally respected professionals working in physics and electrical engineering departments and government laboratories Optical Properties of Materials and Their Applications, 2nd Edition is an ideal book for senior undergraduate and postgraduate students, and teaching and research professionals in the fields of physics, chemistry, chemical engineering, materials science, and materials engineering.
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
This handbook--a sequel to the widely used Handbook of Optical Constants of Solids--contains critical reviews and tabulated values of indexes of refraction (n) and extinction coefficients (k) for almost 50 materials that were not covered in the original handbook. For each material, the best known n and k values have been carefully tabulated, from the x-ray to millimeter-wave region of the spectrum by expert optical scientists. In addition, the handbook features thirteen introductory chapters that discuss the determination of n and k by various techniques.* Contributors have decided the best values for n and k* References in each critique allow the reader to go back to the original data to examine and understand where the values have come from* Allows the reader to determine if any data in a spectral region needs to be filled in* Gives a wide and detailed view of experimental techniques for measuring the optical constants n and k* Incorporates and describes crystal structure, space-group symmetry, unit-cell dimensions, number of optic and acoustic modes, frequencies of optic modes, the irreducible representation, band gap, plasma frequency, and static dielectric constant
Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments.