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Dielectrics in Electric Fields explores the influence of electric fields on dielectric—i.e., non-conducting or insulating—materials, examining the distinctive behaviors of these materials through well-established principles of physics and engineering. Featuring five new chapters, nearly 200 new figures, and more than 800 new citations, this fully updated and significantly expanded Second Edition: Analyzes inorganic substances with real-life applications in harsh working conditions such as outdoor, nuclear, and space environments Introduces methods for measuring dielectric properties at microwave frequencies, presenting results obtained for specific materials Discusses the application of dielectric theory in allied fields such as corrosion studies, civil engineering, and health sciences Combines in one chapter coverage of electrical breakdown in gases with breakdown in micrometric gaps Offers extensive coverage of electron energy distribution—essential knowledge required for the application of plasma sciences in medical science Delivers a detailed review of breakdown in liquids, along with an overview of electron mobility, providing a clear understanding of breakdown phenomena Explains breakdown in solid dielectrics such as single crystals, polycrystalline and amorphous states, thin films, and powders compressed to form pellets Addresses the latest advances in dielectric theory and research, including cutting-edge nanodielectric materials and their practical applications Blends early classical papers that laid the foundation for much of the dielectric theory with more recent work The author has drawn from more than 55 years of research studies and experience in the areas of high-voltage engineering, power systems, and dielectric materials and systems to supply both aspiring and practicing engineers with a comprehensive, authoritative source for up-to-date information on dielectrics in electric fields.
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Here, more than 20 experts from leading research institutes around the world present the entire scope of this rapidly developing field. In so doing, they cover a wide range of topics, including the characterization and investigation of structural, dielectric and piezoelectric properties of ceramic materials, a well as phase transitions, electrical and optical properties and microscopic investigations. Another feature is a complete profile of the properties of polar oxides -- from their proof to their latest applications. Throughout, the authors review, discuss and assess the material properties with regard to new and advanced characterization and imaging techniques. For physicists, physicochemists, semiconductor and solid state physicists, materials scientists, and students of chemistry and physics.
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Barium titanate thin films were deposited via chemical solution deposition using a hybrid-chelate chemistry directly on copper foil substrates. A process was developed to crystallize and densify the ferroelectric films at 900C by using a reductive atmosphere containing nitrogen, hydrogen, water vapor, and oxygen impurities such that film constituents were oxidized to form barium titanate and the foil substrate remained metallic. The crystallized films are polycrystalline with equiaxed morphology and average grain diameters in excess of 100 nm. The dielectric properties exhibit permittivities in excess of 1800 at room temperature and zero bias with tunabilites of greater than 90% and high field loss tangents of less than 1%. A series of samples was prepared with varying grain and crystallite sizes by dividing and processing a single film over a range of temperature from 700 to 900C. This ensures that the chemical composition and film thickness is invariant for each sample. It is shown that the grain size increases with higher process temperatures and results in a concomitant increase in permittivity and tunability. These enhancements, combined with the constant paraelectricD erroelectric phase transition temperature, indicated that a combination of film crystallinity and grain size is responsible for diminished performance. The phase transition temperature and temperature coefficient of capacitance modified by partially substituting zirconium, hafnium, and tin for titanium. The resulting films were single phase and the phase transition shifts were consistent with bulk materials. A reduction in permittivity was observed for increasing substituent level and was attributed to a reduction in grain size for both barium titanate zirconate and barium titanate hafnate. Processing conditions were chosen to stabilize Sn2+ during the firing process in an attempt to flux the system and increase grain size. The barium titanate stannate films had less reduction in grain size.