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This report describes research to reduce the intrinsic bonding defects in amorphous and microcrystalline Si alloys by controlling the bonding chemistry and the microstructure via the deposition process reactions. The specific approach was to use remote plasma-enhanced, chemical-vapor deposition (PECVD) and reactive magnetron sputtering to limit the multiplicity of deposition inaction pathways, and thereby gain increased control over the thin-film chemistry and microstrucre. The research included (1) the deposition of amorphous and microcrystalline Si alloy materials by the PECVD process and by reactive magnetron sputtering, and (2) the evaluation of the material properties of these films for potential applications in PV devices. The focus of the research was on pining a fundamental understanding of the relationships between deposition reaction pathways, the bonding of dopant and alloy atoms, and the electrical provides of importance for PV applications. This involved studying the factors that contribute to defect generation and to defect removal and/or neutralization. In addition to the experimental studies, the research also included theoretical and modeling studies aimed at understanding the relationships between local atomic arrangements of Si and alloy atoms, and the electrical, optical, vibrational, and defect properties.
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Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Photovoltaic technology has now developed to the extent that it is close to fulfilling the vision of a "solar-energy world," as devices based on this technology are becoming efficient, low-cost and durable. This book provides a comprehensive treatment of thin-film silicon, a prevalent PV material, in terms of its semiconductor nature, startin