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Transport phenomena in plasmas are the relatively slow processes of particle momentum and energy transport systems in a state of mechanical equilibrium. In contrast to neutral gases, these phenomena in plasmas are greatly influenced by self-consistent fields, in particular electric fields. These can produce particle and energy fluxes, in addition to those generated by the inhomogeneity of the plasma composition and temperature. As a result, the physical effects accompanying transport phenomena in plasmas are far more numerous and complicated than those in neutral gases, and the solution of corresponding problems is more difficult. The effects, however, are usually far more interesting and sometimes surprising. This book presents a systematic survey and analysis of the main mechanisms of transport phenomena in plasma and gives examples of gradually increasing complexity to illustrate these mechanisms and the relationships between them. The author pays special attention to the analysis of experimental measurements and considers the relevant processes analytically as well as qualitatively. The majority of problems dealt with in this book are of considerable practical interest, and the phenomena described often determine the main characteristics of processes and devices. Transport Phenomena in Partially Ionized Plasma will be of interest to researchers who need to know the properties of real, specific systems, as well as to engineers and advanced students in the physics of plasmas, semiconductors, various types of gas discharges and the ionosphere.
The NATO . Advanced Research Insti tute on Nonequilibrium Processes in Partially Ionized Gases was held at Acquafredda di Maratea during 4-17 June 1989. The Institute considered the interconnections between scattering and transport theories and modeling of nonequilibrium systems generated by electrical discharges, emphasizing the importance of microscopic processes in affecting the bulk properties of plasmas. The book tries to reproduce these lines. In particular several contributions describe scattering cross sections involving electrons interacting with atoms and molecules in both ground and excited states (from theoretical and experimental point of view), of energy transfer processes as well as reactive ones involving excited molecules colliding with atoms and molecules as well as with metallic surfaces. Other contributions deal with the basis of transport theories (Boltzmann and Monte Carlo methods) for describing the bulk properties of non equilibrium plasmas as well as with the modeling of complicated systems emphasizing in particular the strong coupling between the Boltzmann equation and excited state kinetics. Finally the book contains several contributions describing applications in different fields such as Excimer Lasers, Negative Ion Production, RF Discharges, Plasma Chemistry, Atmospheric Processes and Physics of Lamps. The Organizing Committee gratefully acknowledges the generous financial support provided by the NATO Science Committee as well as by Azienda Autonoma di Soggiorno e Turismo of Maratea, by University of Bari, by C. N. R. (Centro di Studio per la Chimica dei Plasmi and Comitato per la Chimica), by ENEA, by Lawrence Livermore Laboratory and by US Army Research Office.
Introduction to Plasma Physics is the standard text for an introductory lecture course on plasma physics. The text's six sections lead readers systematically and comprehensively through the fundamentals of modern plasma physics. Sections on single-particle motion, plasmas as fluids, and collisional processes in plasmas lay the groundwork for a thorough understanding of the subject. The authors take care to place the material in its historical context for a rich understanding of the ideas presented. They also emphasize the importance of medical imaging in radiotherapy, providing a logical link to more advanced works in the area. The text includes problems, tables, and illustrations as well as a thorough index and a complete list of references.
This textbook provides a modern and accessible introduction to magnetohydrodynamics (MHD). It describes the two main applications of plasma physics, laboratory research on thermo-nuclear fusion energy and plasma astrophysics of the solar system, stars and accretion disks, from the single viewpoint of MHD. This approach provides effective methods and insights for the interpretation of plasma phenomena on virtually all scales, from the laboratory to the universe. It equips the reader with the necessary tools to understand the complexities of plasma dynamics in extended magnetic structures. The classical MHD model is developed in detail without omitting steps in the derivations and problems are included at the end of each chapter. This text is ideal for senior-level undergraduate and graduate courses in plasma physics and astrophysics.
TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.
The book is a comprehensive edition which considers the interactions of atoms, ions and molecules with charged particles, photons and laser fields and reflects the present understanding of atomic processes such as electron capture, target and projectile ionisation, photoabsorption and others occurring in most of laboratory and astrophysical plasma sources including many-photon and many-electron processes. The material consists of selected papers written by leading scientists in various fields.
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.