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This thesis constitutes a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques. The nanostructures were grown using different precursor materials such as Co2(CO)8, Fe2(CO)9, W(CO)6, (CH3)3Pt(CpCH3) and were characterized by a wide range of techniques. This work reports results obtained for the morphology, the microstructure, the composition, the electrical transport mechanism, magnetic and superconducting properties of nanostructures. The results offers exciting prospects in a wide range of applications in nanotechnology and condensed matter physics.
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
FIB Nanostructures reviews a range of methods, including milling, etching, deposition, and implantation, applied to manipulate structures at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially extends the range of possible applications of nanofabrication. FIB techniques are widely used in the semiconductor industry and in materials research for deposition and ablation, including the fabrication of nanostructures such as nanowires, nanotubes, nanoneedles, graphene sheets, quantum dots, etc. The main objective of this book is to create a platform for knowledge sharing and dissemination of the latest advances in novel areas of FIB for nanostructures and related materials and devices, and to provide a comprehensive introduction to the field and directions for further research. Chapters written by leading scientists throughout the world create a fundamental bridge between focused ion beam and nanotechnology that is intended to stimulate readers' interest in developing new types of nanostructures for application to semiconductor technology. These applications are increasingly important for the future development of materials science, energy technology, and electronic devices. The book can be recommended for physics, electrical engineering, and materials science departments as a reference on materials science and device design.
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Sixth volume of a 40 volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Magnetic Characterization Techniques for Nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
Theoretical and Numerical Analysis can be used by research students to design different systems to generate electric fields with required characteristics. Says author K.A.G. Rao, "When I was doing my Ph.D. thesis, I used some mathematical models. In 2005, I got the idea that I could use the same models for designing different kinds of electric fields. So I started working on nonconventional systems like curved surfaces and flat elliptic surfaces, both conducting and nonconducting. The work, which was mostly mathematical, took me nearly three years."
This book covers the fundamentals of Helium Ion Microscopy (HIM) including the Gas Field Ion Source (GFIS), column and contrast formation. It also provides first hand information on nanofabrication and high resolution imaging. Relevant theoretical models and the existing simulation approaches are discussed in an extra section. The structure of the book allows the novice to get acquainted with the specifics of the technique needed to understand the more applied chapters in the second half of the volume. The expert reader will find a complete reference of the technique covering all important applications in several chapters written by the leading experts in the field. This includes imaging of biological samples, resist and precursor based nanofabrication, applications in semiconductor industry, using Helium as well as Neon and many more. The fundamental part allows the regular HIM user to deepen his understanding of the method. A final chapter by Bill Ward, one of the pioneers of HIM, covering the historical developments leading to the existing tool complements the content.
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.