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This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Traditional macro-optics can be designed without complex design software tools. However, digital optics, especially wafer-scale micro-optics, require specific software and tools. There is often no analytical solution, and thus complex iterative optimization algorithms may be required. This book covers refractive and diffractive micro-optics, the iterative optimization process, and modeling and fabrication techniques crucial to this field. The ability to create hybrid systems capable of producing analog and digital functionality is also addressed.
Provides optical designers, shop managers, opticians, and purchasers a concise reference explaining what the designer needs to know before making final choices and how to specify the components before they are ordered. It presents how conventional fabrication proceeds for representative components, alternative and emerging methods to optical fabrication, product evaluation, and the calculations used.
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Provides a concise overview of physical optics for easy reference, with a focus on information applicable to the field of optical engineering. Within this Field Guide, you will find formulae and descriptions of electromagnetic wave phenomena that are fundamental to the wave theory of light.
"Today's SWIR, MWIR, LWIR and multispectral technologies cover a wide range of commercial and military applications and continue to rapidly expand in almost every aspect of our lives. This Field Guide focuses on the most common infrared crystals and glasses used in these systems, from their manufacturing methods through modern optical fabrication technologies to the end-use applications. Detailed optical, crystallographic, mechanical, chemical, and thermal properties of the most popular infrared materials are reviewed in detail along with process flows and relative comparisons. The Field Guide to Infrared Optical Materials provides a concise and convenient resource for those interested in the materials used in infrared optical systems"--
Includes Proceedings Vols. 5631, 5636, 5637, 5642, 5643
Linear systems is a broad and important area in many scientific and engineering disciplines, and it is especially important in optics because it forms the basis for Fourier optics, diffraction theory, image-quality assessment, and many other areas. This Field Guide provides the practicing optical engineer with a reference for the basic concepts and techniques of linear systems, including Fourier series, continuous and discrete Fourier transforms, convolution, sampling and aliasing, and MTF/PSF using the language, notation, and applications from optics, imaging, and diffraction.
This Field Guide is designed for those looking for a condensed and concise source of key concepts, equations, and techniques for nonlinear optics. Examples throughout this Field Guide illustrate fundamental concepts while demonstrating the application of key equations. Topics covered include technologically important effects, recent developments in nonlinear optics, and linear optical properties central to nonlinear phenomena, with a focus on real-world applicability in the field of nonlinear optics.