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A detailed presentation of the physics of electron beam-specimen interactions Electron microscopy is one of the most widely used characterisation techniques in materials science, physics, chemistry, and the life sciences. This book examines the interactions between the electron beam and the specimen, the fundamental starting point for all electron microscopy. Detailed explanations are provided to help reinforce understanding, and new topics at the forefront of current research are presented. It provides readers with a deeper knowledge of the subject, particularly if they intend to simulate electron beam-specimen interactions as part of their research projects. The book covers the vast majority of commonly used electron microscopy techniques. Some of the more advanced topics (annular bright field and dopant atom imaging, atomic resolution chemical analysis, band gap measurements) provide additional value, especially for readers who have access to advanced instrumentation, such as aberration-corrected and monochromated microscopes. Electron Beam-Specimen Interactions and Simulation Methods in Microscopy offers enlightening coverage of: the Monte-Carlo Method; Multislice Simulations; Bloch Waves in Conventional and Analytical Transmission Electron Microscopy; Bloch Waves in Scanning Transmission Electron Microscopy; Low Energy Loss and Core Loss EELS. It also supplements each chapter with clear diagrams and provides appendices at the end of the book to assist with the pre-requisites. A detailed presentation of the physics of electron beam-specimen interactions Each chapter first discusses the background physics before moving onto simulation methods Uses computer programs to simulate electron beam-specimen interactions (presented in the form of case studies) Includes hot topics brought to light due to advances in instrumentation (particularly aberration-corrected and monochromated microscopes) Electron Beam-Specimen Interactions and Simulation Methods in Microscopy benefits students undertaking higher education degrees, practicing electron microscopists who wish to learn more about their subject, and researchers who wish to obtain a deeper understanding of the subject matter for their own work.
This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.
This book features reviews by leading experts on the methods and applications of modern forms of microscopy. The recent awards of Nobel Prizes awarded for super-resolution optical microscopy and cryo-electron microscopy have demonstrated the rich scientific opportunities for research in novel microscopies. Earlier Nobel Prizes for electron microscopy (the instrument itself and applications to biology), scanning probe microscopy and holography are a reminder of the central role of microscopy in modern science, from the study of nanostructures in materials science, physics and chemistry to structural biology. Separate chapters are devoted to confocal, fluorescent and related novel optical microscopies, coherent diffractive imaging, scanning probe microscopy, transmission electron microscopy in all its modes from aberration corrected and analytical to in-situ and time-resolved, low energy electron microscopy, photoelectron microscopy, cryo-electron microscopy in biology, and also ion microscopy. In addition to serving as an essential reference for researchers and teachers in the fields such as materials science, condensed matter physics, solid-state chemistry, structural biology and the molecular sciences generally, the Springer Handbook of Microscopy is a unified, coherent and pedagogically attractive text for advanced students who need an authoritative yet accessible guide to the science and practice of microscopy.
The examination of materials using electron beam techniques has developed continuously for over twenty years and there are now many different methods of extracting detailed structural and chemical information using electron beams. These techniques which include electron probe microanalysis, trans mission electron microscopy, Auger spectroscopy and scanning electron microscopy have, until recently, developed more or less independently of each other. Thus dedicated instruments designed to optimize the performance for a specific application have been available and correspondingly most of the available textbooks tend to have covered the theory and practice of an individual technique. There appears to be no doubt that dedicated instru ments taken together with the specialized textbooks will continue to be the appropriate approach for some problems. Nevertheless the underlying electron-specimen interactions are common to many techniques and in view of the fact that a range of hybrid instruments is now available it seems appropriate to provide a broad-based text for users of these electron beam facilities. The aim of the present book is therefore to provide, in a reasonably concise form, the material which will allow the practitioner of one or more of the individual techniques to appreciate and to make use of the type of information which can be obtained using other electron beam techniques.
This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to "read it all" to understand a topic Includes an online supplement—an extensive "Database of Electron–Solid Interactions"—which can be accessed on SpringerLink, in Chapter 3
Modeling Nanoscale Imaging in Electron Microscopy presents the recent advances that have been made using mathematical methods to resolve problems in microscopy. With improvements in hardware-based aberration software significantly expanding the nanoscale imaging capabilities of scanning transmission electron microscopes (STEM), these mathematical models can replace some labor intensive procedures used to operate and maintain STEMs. This book, the first in its field since 1998, will also cover such relevant concepts as superresolution techniques, special denoising methods, application of mathematical/statistical learning theory, and compressed sensing.
This book highlights what is now achievable in terms of materials characterization with the new generation of cold-field emission scanning electron microscopes applied to real materials at high spatial resolution. It discusses advanced scanning electron microscopes/scanning- transmission electron microscopes (SEM/STEM), simulation and post-processing techniques at high spatial resolution in the fields of nanomaterials, metallurgy, geology, and more. These microscopes now offer improved performance at very low landing voltage and high -beam probe current stability, combined with a routine transmission mode capability that can compete with the (scanning-) transmission electron microscopes (STEM/-TEM) historically run at higher beam accelerating voltage
This book has evolved by processes of selection and expansion from its predecessor, Practical Scanning Electron Microscopy (PSEM), published by Plenum Press in 1975. The interaction of the authors with students at the Short Course on Scanning Electron Microscopy and X-Ray Microanalysis held annually at Lehigh University has helped greatly in developing this textbook. The material has been chosen to provide a student with a general introduction to the techniques of scanning electron microscopy and x-ray microanalysis suitable for application in such fields as biology, geology, solid state physics, and materials science. Following the format of PSEM, this book gives the student a basic knowledge of (1) the user-controlled functions of the electron optics of the scanning electron microscope and electron microprobe, (2) the characteristics of electron-beam-sample inter actions, (3) image formation and interpretation, (4) x-ray spectrometry, and (5) quantitative x-ray microanalysis. Each of these topics has been updated and in most cases expanded over the material presented in PSEM in order to give the reader sufficient coverage to understand these topics and apply the information in the laboratory. Throughout the text, we have attempted to emphasize practical aspects of the techniques, describing those instru ment parameters which the microscopist can and must manipulate to obtain optimum information from the specimen. Certain areas in particular have been expanded in response to their increasing importance in the SEM field. Thus energy-dispersive x-ray spectrometry, which has undergone a tremendous surge in growth, is treated in substantial detail.