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The examination of materials using electron beam techniques has developed continuously for over twenty years and there are now many different methods of extracting detailed structural and chemical information using electron beams. These techniques which include electron probe microanalysis, trans mission electron microscopy, Auger spectroscopy and scanning electron microscopy have, until recently, developed more or less independently of each other. Thus dedicated instruments designed to optimize the performance for a specific application have been available and correspondingly most of the available textbooks tend to have covered the theory and practice of an individual technique. There appears to be no doubt that dedicated instru ments taken together with the specialized textbooks will continue to be the appropriate approach for some problems. Nevertheless the underlying electron-specimen interactions are common to many techniques and in view of the fact that a range of hybrid instruments is now available it seems appropriate to provide a broad-based text for users of these electron beam facilities. The aim of the present book is therefore to provide, in a reasonably concise form, the material which will allow the practitioner of one or more of the individual techniques to appreciate and to make use of the type of information which can be obtained using other electron beam techniques.
Analytical electron microscopy is one of the most powerful tools today for characterization of the advanced materials that support the nanotechnology of the twenty-first century. In this book the authors clearly explain both the basic principles and the latest developments in the field. In addition to a fundamental description of the inelastic scattering process, an explanation of the constituent hardware is provided. Standard quantitative analytical techniques employing electron energy-loss spectroscopy and energy-dispersive X-ray spectroscopy are also explained, along with elemental mapping techniques. Included are sections on convergent beam electron diffraction and electron holography utilizing the field emission gun. With generous use of illustrations and experimental data, this book is a valuable resource for anyone concerned with materials characterization, electron microscopy, materials science, crystallography, and instrumentation.
This text provides students as well as practitioners with a comprehensive introduction to the field of scanning electron microscopy (SEM) and X-ray microanalysis. The authors emphasize the practical aspects of the techniques described. Topics discussed include user-controlled functions of scanning electron microscopes and x-ray spectrometers and the use of x-rays for qualitative and quantitative analysis. Separate chapters cover SEM sample preparation methods for hard materials, polymers, and biological specimens. In addition techniques for the elimination of charging in non-conducting specimens are detailed.
A detailed presentation of the physics of electron beam-specimen interactions Electron microscopy is one of the most widely used characterisation techniques in materials science, physics, chemistry, and the life sciences. This book examines the interactions between the electron beam and the specimen, the fundamental starting point for all electron microscopy. Detailed explanations are provided to help reinforce understanding, and new topics at the forefront of current research are presented. It provides readers with a deeper knowledge of the subject, particularly if they intend to simulate electron beam-specimen interactions as part of their research projects. The book covers the vast majority of commonly used electron microscopy techniques. Some of the more advanced topics (annular bright field and dopant atom imaging, atomic resolution chemical analysis, band gap measurements) provide additional value, especially for readers who have access to advanced instrumentation, such as aberration-corrected and monochromated microscopes. Electron Beam-Specimen Interactions and Simulation Methods in Microscopy offers enlightening coverage of: the Monte-Carlo Method; Multislice Simulations; Bloch Waves in Conventional and Analytical Transmission Electron Microscopy; Bloch Waves in Scanning Transmission Electron Microscopy; Low Energy Loss and Core Loss EELS. It also supplements each chapter with clear diagrams and provides appendices at the end of the book to assist with the pre-requisites. A detailed presentation of the physics of electron beam-specimen interactions Each chapter first discusses the background physics before moving onto simulation methods Uses computer programs to simulate electron beam-specimen interactions (presented in the form of case studies) Includes hot topics brought to light due to advances in instrumentation (particularly aberration-corrected and monochromated microscopes) Electron Beam-Specimen Interactions and Simulation Methods in Microscopy benefits students undertaking higher education degrees, practicing electron microscopists who wish to learn more about their subject, and researchers who wish to obtain a deeper understanding of the subject matter for their own work.
This book has evolved by processes of selection and expansion from its predecessor, Practical Scanning Electron Microscopy (PSEM), published by Plenum Press in 1975. The interaction of the authors with students at the Short Course on Scanning Electron Microscopy and X-Ray Microanalysis held annually at Lehigh University has helped greatly in developing this textbook. The material has been chosen to provide a student with a general introduction to the techniques of scanning electron microscopy and x-ray microanalysis suitable for application in such fields as biology, geology, solid state physics, and materials science. Following the format of PSEM, this book gives the student a basic knowledge of (1) the user-controlled functions of the electron optics of the scanning electron microscope and electron microprobe, (2) the characteristics of electron-beam-sample inter actions, (3) image formation and interpretation, (4) x-ray spectrometry, and (5) quantitative x-ray microanalysis. Each of these topics has been updated and in most cases expanded over the material presented in PSEM in order to give the reader sufficient coverage to understand these topics and apply the information in the laboratory. Throughout the text, we have attempted to emphasize practical aspects of the techniques, describing those instru ment parameters which the microscopist can and must manipulate to obtain optimum information from the specimen. Certain areas in particular have been expanded in response to their increasing importance in the SEM field. Thus energy-dispersive x-ray spectrometry, which has undergone a tremendous surge in growth, is treated in substantial detail.
From its early days in the 1950s, the electron microanalyzer has offered two principal ways of obtaining x-ray spectra: wavelength dispersive spectrometry (WDS), which utilizes crystal diffraction, and energy dispersive spectrometry (EDS), in which the x-ray quantum energy is measured directly. In general, WDS offers much better peak separation for complex line spectra, whereas EDS gives a higher collection efficiency and is easier and cheaper to use. Both techniques have undergone major transformations since those early days, from the simple focusing spectrometerand gas proportional counter of the 1950s to the advanced semiconductor detectors and programmable spectrometersoftoday. Becauseofthesedevelopments, thecapabilities and relative merits of EDS and WDS techniques have been a recurring feature of microprobeconferences for nearly40 years, and this volume bringstogetherthepapers presented at the Chuck Fiori Memorial Symposium, held at the Microbeam Analysis Society Meeting of 1993. Several themes are apparent in this rich and authoritative collection of papers, which have both a historical and an up-to-the-minute dimension. Light element analysis has long been a goal of microprobe analysts since Ray Dolby first detected K radiation with a gas proportional counter in 1960. WDS techniques (using carbon lead stearate films) were not used for this purpose until four years later. Now synthetic multilayers provide the best dispersive elements for quantitative light element analy sis-still used in conjunction with a gas counter.
In the spring of 1963, a well-known research institute made a market survey to assess how many scanning electron microscopes might be sold in the United States. They predicted that three to five might be sold in the first year a commercial SEM was available, and that ten instruments would saturate the marketplace. In 1964, the Cambridge Instruments Stereoscan was introduced into the United States and, in the following decade, over 1200 scanning electron microscopes were sold in the U. S. alone, representing an investment conservatively estimated at $50,000- $100,000 each. Why were the market surveyers wrongil Perhaps because they asked the wrong persons, such as electron microscopists who were using the highly developed transmission electron microscopes of the day, with resolutions from 5-10 A. These scientists could see little application for a microscope that was useful for looking at surfaces with a resolution of only (then) about 200 A. Since that time, many scientists have learned to appreciate that information content in an image may be of more importance than resolution per se. The SEM, with its large depth of field and easily that often require little or no sample prepara interpreted images of samples tion for viewing, is capable of providing significant information about rough samples at magnifications ranging from 50 X to 100,000 X. This range overlaps considerably with the light microscope at the low end, and with the electron microscope at the high end.